Seagate Technologies, Inc.

Simon Wing Fung

Eric Steck Freeman

Frank Richard Reynen

Andu Alem Tefera

Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds. The apparatus provides for a smoother disk surface heretofore available, the surface being significantly more uniform than known batch process apparatus for polishing and texturing disks, leading to increased recording reliability, and increased efficiency of manufacturing through reduced manufacturing and post-deployment failures.

Apparatus for the application of an advanced texture process

Method for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a large surface pad and polishing tape combination while in contact with a rotating disk surface that is also moving in a circumferential direction to completely remove the random scratches previously formed by a polishing step. The scratches are removed with the aid of a specially designed, extremely fine alumina slurry composition which prevent producing similar size circumferential scratches at the high surface speeds. The methodology provides for a smoother disk surface than prior known super-polish/texture methodologies. The methodology taught by the principles of the present invention is inherently more uniform than known batch process for polishing and texturing disks and leads to increased efficiency of media manufacturing through reduced manufacturing and post-deployment failures.

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Fremont, CA, United States of America

Simon Wing Fung