Draka Comteq B.v.

Horiba Jobin Yvon Sas

Horiba France Sas

Simon Richard

Pierre Sillard

Louis-Anne De Montmorillon

Denis Molin

Pascale Nouchi

Marianne Bigot-Astruc

Bob J Overton

Yves Lumineau

Pieter Matthijsse

Frans Gooijer

Alain Pastouret

Franciscus Johannes Achten

Ekaterina Burov

Ivo Flammer

David Boivin

Olivier Acher

Emmanuel Petitfrere

Elise Regnier

Patrick Chapon

Viviane Millet

Alexander Podzorov

Jean-Paul Gaston

Sébastien Laden

Thanh-Liem Nguyen

Olivier Cavani

Dmitri Kouznetsov

Christian Brach

Sebastien Corde

Melanie Gaillet

Daphne Heran

Adrian Knowles

Louis-Anne Montmorillon

Sébastien Corde

Daphné Heran

Mélanie Gaillet

Disclosed is a method for measuring etch depth including the following steps: splitting a light beam into a first, and respectively second, incident beam directed towards a first, respectively second, area of a sample exposed to an etching treatment to form a first, and respectively second, reflected beam, recombining the first reflected beam and the second reflected beam to form an interferometric beam; detecting a first, and respectively second, interferometric intensity signal relative to a first, respectively second, polarisation component; calculating a lower envelope function and an upper envelope function of a differential polarimetric interferometry signal; determining an offset function and a normalisation function from the first lower envelope function and the first upper envelope function; and calculating a differential polarimetric interferometry function normalised locally at each time instant.

Method and instrument for measuring etch depth by differential polarimetric interferometry and glow discharge spectrometry apparatus comprising such a measuring instrument

Disclosed is a method for acquiring and forming a spectrometry image, including the following steps: a) acquiring an initial structural image of an area of a sample; b) breaking down the initial structural image so as to determine a multi-scale spatial sample of the area of the sample; c) determining a plurality of spectrometry measurement positions in the area of the sample, as a function of the multi-scale spatial sampling determined in step b); d) consecutively, for each spectrometry measurement position determined in step c), positioning the excitation beam and acquiring a spectrometry measurement; and e) reconstructing a spectrometry image point-by-point from the spectrometry measurements acquired in step d).

Method for acquiring and forming a spectrometry image by adapted spatial sampling

Disclosed is a micro-localisation device defining a system of spatial coordinates for an imaging instrument. The micro-localisation device includes at least one first zone and a second zone, adjacent to each other, each zone extending spatially over an area of macroscopic size, each zone including an elementary cell or a tiling of a plurality of elementary cells extending over the respective area of the zone, each elementary cell of the first, respectively second, zone including an orientation pattern, a positioning pattern and a periodic spatial pattern, configured to be imaged by an imaging instrument and to determine a position and, respectively an orientation of the imaging instrument in the system of spatial coordinates of the micro-localisation device.

Micro-localisation method and device for an imaging instrument and a measuring apparatus

A glow discharge spectrometry system includes a glow discharge lamp suitable for receiving a solid sample () and forming a glow discharge etching plasma (). The system () for measuring in situ the depth of the erosion crater generated by etching of the sample () includes an optical separator (), optical elements () suitable for directing a first incident beam () toward a first zone () of the sample, the first zone being exposed to the etching plasma, and a second incident beam () toward a second zone () of the same side of the sample, the second zone being protected from the etching plasma, respectively, and an optical recombining device () suitable for forming an interferometric beam () so as to determine the depth (d) of the erosion crater.

Glow discharge spectroscopy method and system for measuring in situ the etch depth of a sample

A spectrometer () for analyzing the spectrum of an upstream light beam () includes an entrance slit () and angular dispersing elements (). The angular dispersing elements include at least one polarization-dependent diffraction grating that is suitable for, at the plurality of wavelengths (), diffracting a corrected light beam () into diffracted light beams () in a given particular diffraction order of the polarization-dependent diffraction grating, which is either the +1 diffraction order or the &#x2212;1 diffraction order, when the corrected light beam has a preset corrected polarization state that is circular; and the spectrometer includes elements for modifying polarization () placed between the entrance slit and the angular dispersion elements, which are suitable for modifying the polarization state of the upstream light beam in order to generate the corrected light beam with a preset corrected polarization state.

Spectrometer of high diffraction efficiency for analyzing the spectrum of a light beam

A spectrometer () for analyzing the spectrum of an upstream light beam (), includes an entrance slit () and collimating elements () suitable for generating, from the upstream light beam, a collimated light beam (), characterized in that it also includes: a polarization-dependent diffraction grating () suitable for diffracting, at each wavelength () of the spectrum of the upstream light beam, the collimated light beam into a first diffracted light beam () and a second diffracted light beam (); optical recombining elements () including a planar optical reflecting surface () perpendicular to the grating and suitable for deviating at least the second diffracted light beam; and focussing elements () suitable for focussing, at each wavelength, the first diffracted light beam and the second diffracted light beam onto one and the same focussing area ().

Spectrometer for analysing the spectrum of a light beam

An accurate and robust wavefront-division polarimetric analysis method and device, allows the quasi-instantaneous measurement of the polarization states of a luminous object. The device can be used to produce a plurality of light beams, all polarized according to different polarization states, from a single upstream light beam. The polarized light beams, which do not overlap and which carry information items that are complementary in terms of polarization, are analyzed simultaneously by a plurality of detectors that measure the luminous intensity of each beam. Processing elements digitally process the luminous intensity values obtained in order to determine the polarization state of the upstream light beam. The operations performed by the processing elements prevent luminous intensity variations in the split light beams during the division of the wavefront of the upstream light beam. Therefore, the wavefront-division polarimetric analysis device is robust and its accuracy is not hindered by the experimental conditions.

Wavefront-division polarimetric analysis method and device, spectropolarimeter, polarimetric camera and optical microscope using such a device

A single-mode optical fiber includes a central core, an intermediate cladding, a buried trench, and optical cladding. The central core has an outer radius rand a refractive index difference &#x394;nrelative to the optical cladding. The intermediate cladding has an outer radius rand a refractive index difference &#x394;nrelative to the optical cladding. The buried trench has an outer radius rand a refractive index difference &#x394;nrelative to the optical cladding. The optical fiber typically has an effective area of about 150 &#x3bc;mor greater at a wavelength of 1550 nanometers and exhibits low bending losses.

Single-mode optical fiber

An optical fiber includes a central core, which has a radius rand a refractive index n, and a surrounding optical cladding, which has a refractive index nsuch that n&#x3c;nand 0.31%&#x3c;((n&#x2212;n)&#xf7;n)&#x3c;0.55%. The optical cladding has at least five holes. These holes, which are positioned between about 9 microns and 17 microns from the central core, have a radius rsuch that 0.5r&#x2266;r&#x2266;r.

An optical fiber having a core and an outer cladding, the core including from its center outward a central core having a radius and a refractive index difference with respect to the outer cladding, and a depressed inner cladding. The depressed inner cladding includes at least a first portion having a radius and a refractive index difference with respect to the outer cladding, the first portion preferably being adjacent to the central core, and a second portion adjacent to the first portion constituting a depressed trench having a radius, and a refractive index difference with respect to the outer cladding. The first portion of the inner cladding has a refractive index below the refractive index of the outer cladding, and the depressed trench has a refractive index that is lower than the refractive index of the first portion of the depressed inner cladding. The outer radius of the depressed inner cladding of the optical fiber is between 28 &#x3bc;m and 40 &#x3bc;m, the LPmode leakage losses at a wavelength of 1550 nm are less than 0.01 dB/km and the cable cut-off wavelength is less than 1530 nm.

Single mode optical fiber with depressed trench

The present invention embraces a single-mode optical fiber typically having reduced bending losses. The optical fiber includes a central core, an intermediate cladding, a buried trench, and an outer cladding. The optical fiber typically has (i), at a wavelength of 1310 nanometers, a mode field diameter with a nominal value of between about 8.6 microns and 9.5 microns (and a tolerance of &#xb1;0.4 micron), (ii) a cable cut-off wavelength of no more than 1260 nanometers, and (iii), for a bending radius of 15 millimeters at a wavelength of 1550 nanometers, bending losses of no more than 0.03 dB/turn.

A single-mode optical fiber includes a central core, an intermediate cladding, a depressed trench, and an external optical cladding. The central core has a radius rand a positive refractive index difference &#x394;nwith the optical cladding. The intermediate cladding has a radius rand a refractive index difference &#x394;nwith the optical cladding, wherein &#x394;nis less than &#x394;n. The depressed trench has a radius rand a negative index difference &#x394;nwith the optical cladding. At a wavelength of 1310 nanometers, the optical fiber has a mode field diameter (MFD) between 8.6 microns and 9.5 microns and, at a wavelength of 1550 nanometers, the optical fiber has bending losses less than about 0.25&#xd7;10dB/turn for a radius of curvature of 15 millimeters. At a wavelength of 1260 nanometers, attenuation of the LP11 mode to 19.3 dB is achieved over less than 90 meters of fiber.

Single-mode optical fiber having reduced bending losses

Disclosed is an improved, single-mode optical fiber possessing a novel coating system. When combined with a bend-insensitive glass fiber, the novel coating system according to the present invention yields an optical fiber having exceptionally low losses. The coating system features (i) a softer primary coating with excellent low-temperature characteristics to protect against microbending in any environment and in the toughest physical situations and, optionally, (ii) a colored secondary coating possessing enhanced color strength and vividness. The secondary coating provides improved ribbon characteristics for structures that are robust, yet easily entered (i.e., separated and stripped). The optional dual coating is specifically balanced for superior heat stripping in fiber ribbons, with virtually no residue left behind on the glass. This facilitates fast splicing and terminations. The improved coating system provides optical fibers that offer significant advantages for deployment in most, if not all, fiber-to-the-premises (FTTx) systems.

Microbend-resistant optical fiber

A single-mode optical fiber possesses, at a wavelength of 1550 nanometers, an effective area greater than about 90 pm2 without degradation of the optical fiber's other optical parameters. The single-mode optical fiber includes a central core, a first intermediate cladding, a second intermediate cladding, and an outer cladding. The optical fiber also has a cable cut-off wavelength of less than 1260 nanometers. Additionally, at a wavelength of 1310 nanometers, the optical fiber possesses a mode field diameter of between about 8.6 microns and 9.5 microns. Furthermore, the optical fiber possesses a zero chromatic dispersion wavelength of between about 1300 nanometers and 1324 nanometers and, at the zero chromatic dispersion wavelength, a dispersion slope of less than 0.092 ps/(nm2&#x2033;km).

A single-mode optical fiber includes a central core, a first inner cladding, a second inner cladding, and an outer cladding. The optical fiber, at a wavelength of 1550 nanometers, has an effective area greater than or equal to 100 &#x3bc;m. The optical fiber also has a cable cut-off wavelength less than 1260 nanometers. Additionally, the optical fiber possesses a zero chromatic dispersion wavelength of between about 1300 nanometers and 1324 nanometers and, at the zero chromatic dispersion wavelength, a dispersion slope of less than 0.092 ps/(nm&#xb7;km).

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Villebon sur Yvette, France

Simon Richard