Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Simon Diemer

Emanuel Heindl

David Roddom

Janina Schulz

Dirk Preikszas

Wolfgang Berger

Jaroslaw Paluszynski

Hubert Mantz

A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.

Method for operating a particle beam microscope

The disclosure relates to a sample carrier for accommodating a microscopic sample for examination or processing in a microscope system. The sample carrier is accommodatable in an accommodating device, such that the sample carrier in the accommodated state assumes a defined orientation relative to the accommodating device. The sample carrier has an individual sample carrier identifier and is designed to communicate with the microscope system and in the process to communicate the individual sample carrier identifier to the microscope system, such that a sample accommodated on the sample carrier is trackable.

Device and method for tracking microscopic samples

A method of operating a charged particle microscope comprises: providing settings of a focus, an x-stigmator and an y-stigmator of the charged particle microscope; and then repeatedly performing adjusting the charged particle microscope to the settings, recording an image of an object using the settings, determining a sharpness measure from the recorded image, and changing at least one of the settings of the focus, the x-stigmator and the y-stigmator based on the sharpness measure until a stop criterion is fulfilled. Herein, the determining of the sharpness measure comprises: determining an orientation of an intensity gradient at each of a plurality of locations within one of the recorded image and a processed image generated by processing the recorded image, and determining the sharpness measure based on the plurality of determined orientations.

Method of operating a charged particle microscope and charged particle microscope operating according to such method

A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole fieldgenerated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole fieldwhile energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.

Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system

A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.

Growing community of inventors

Roettingen, Germany

Simon Diemer