Lam Research Corporation

Silvia Aguilar

Derek Witkowicki

Richard Howard Gould

Travis R Taylor

Brandon L Senn

Scott Vernon Wong

Candi Kristoffersen

Todd Anthony Lopes

Adam Patrick Bateman

Sankaranarayanan Ravi

A chamber is formed to enclose a processing region. A passageway is configured to provide for entry of a substrate into the processing region and removal of the substrate from the processing region. A substrate support structure is disposed within the processing region and configured to support the substrate within the processing region. At least one gas input is configured to supply one or more gases to the processing region. At least one gas output is configured to exhaust gases from the processing region. A humidity control device is configured to control a relative humidity within the processing region. At least one heating device is disposed to provide temperature control of the substrate within the processing region. The processing region of the chamber is directly accessible from a substrate handling module configured to operate at atmospheric pressure.

Halogen removal module and associated systems and methods

A substrate cassette loading system for docking substrate cassettes to a substrate processing system is provided. A plurality of ports passes substrates into the substrate processing system, wherein a first port of the plurality of ports is vertically above a second port of the plurality of ports. A plurality of cassette loaders provides substrate cassettes to the plurality of ports.

Stacked wafer cassette loading system

Growing community of inventors

San Jose, CA, United States of America

Silvia Aguilar