M&t Chemicals, Inc.

Silvester P Valayil

Donald A Arcilesi

Otto Kardos

This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:

Electrodeposition of copper

This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups: A. an aryl amine selected from those exhibiting the formulae: ##STR1## and its reaction product.sup.2 with propane sultone; ##STR2## wherein Z is selected from the group consisting of oxygen and --NCH.sub.2 --C.sub.6 H.sub.5 ; B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

This invention relates to a process and to novel compositions for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member from each of the following two groups:

This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups: A. an aryl amine selected from those exhibiting the formulae: ##SPC1## B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram - equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

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Pontiac, MI, United States of America

Silvester P Valayil