Carl-zeiss-smt Ag

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Siegfried Stacklies

Udo Dinger

Martin Weiser

Frank Eisert

Guenther Seitz

Markus Haidl

Yaolong Chen

A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.

Mirror for use in a projection exposure apparatus

The invention relates to a program-controlled NC data generating method for controlling a CNC wet-grinding machine for machining workpieces made of optical materials to produce aspherical forms, the data of the aspherical forms to be ground being overlaid with correction data.

Method for producing an aspherical optical element

A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.

Method of manufacturing an optical element

A device serves for reflecting electromagnetic waves, in particular in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.

Reflecting device for electromagnetic waves

A workpiece-surface processing head has at least one processing tool which comes into contact with the surface to be processed and whose longitudinal axis is oriented essentially perpendicularly to the surface to be processed. The processing tool, for processing the workpieces, can be traversed by means of at least one drive device in a direction (X; Y) running at least approximately perpendicularly to its longitudinal axis.

Workpiece-surface processing head

An apparatus for polishing or lapping an aspherical surface of a work piece comprises a tool rotatable about an axis, the working surface area of the tool being smaller than the work piece, and an arrangement by means of which the tool and the work piece are adjustable relative to each other in all three directions in space, by means of which the orientation of the tool relative to the work piece is adjustable about at least two axes, and by means of which the work piece is rotatable about an axis.

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Abtsgmuend, Germany

Siegfried Stacklies