Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Sandvik Ab

Other

University of Virginia Patent Foundation

Gesellschaft Fuer Unweltschutzberatung Und -technik Gbr

Ferderal-mogul Wiesbaden Gmbh & Co. Kg

Siegfried Schiller

Klaus Goedicke

Fred Fietzke

Olaf Zywitzki

Jonathan Reschke

Bj&ouml;rn Ljungberg

Henry Morgner

Manfred Neumann

Mats Sj&ouml;strand

Christoph Metzner

Wolfgang Hempel

Viveka Alfredsson

Tomas Hilding

Volker Kirchhoff

Nicolas Schiller

Siegfried Panzer

Bert Scheffel

Joerg Schmidt

Gunter Hotzsch

Haydn N G Wadley

Gerd Andler

Falk Milde

Derek Hass

Mats Ahlgren

Ulf Seyfert

Torbj&ouml;rn Selinder

Jens-Peter Heinss

James F Groves

Torsten Werner

Goesta Mattausch

Steffen Straach

Klaus Gaber

Joachim Pflaumbaum

Friederun Scholze

Kerstin Lindner

Olaf Roder

Ulrich Burth

Haydn N Wadley

Ullrich Heisig

Gerhard Kuehn

Thomas Scholze

Joerg Greilich

Harald Ellert

Gerhard Zeissig

Robert Mohs

Wolfgang Wixwat-Ernst

Plasma deposition apparatus () and method that allows metal or nonmetal vapor () to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense directed gas and vapor stream at working pressures above about 0.0001 mbar using a hollow cathode plasma arc discharge (), and conveys the ionized vapor and/or gas stream towards the substrate () for impact on the surface at energies varying from thermal levels (as low as about 0.05 eV) up to about 300 eV.

Process and apparatus for plasma activated depositions in a vacuum

The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al O , with a grainsize less than 0.1 &mgr;m. The Al O layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450&deg; C. to 700&deg; C. preferably 550&deg; C. to 650&deg; C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;0- angles 45.8 and 66.8 degrees when using Cu radiation identify the &ggr;-phase Al O . The alumina layer is also very strongly textured in the &lsqb;440&rsqb;-direction. The Al O layer is virtually free of cracks and halogen impurities. Furthermore, the Al O layer gives the cutting edge of the tool an extremely smooth surface finish.

PVD Al2O3 coated cutting tool

Process and device for coating substrates utilizing bipolar pulsed magnetron sputtering in the frequency range between 10 and 100 kHz, wherein the device includes at least three magnetron sources. Each of the at least three magnetron sources includes a target. At least two of the targets are connected to a potential-free bipolar power supply device. The at least three targets are arranged relative to the substrates in such a way that the substrates are located at least partially inside a discharge current during a coating of the substrates. A switching device is adapted to connect the targets to the bipolar power supply device. A technological predetermined program is used for controlling the switching device. The switching device connects at least two of the targets at a time to the bipolar power supply device according to the technologically predetermined program.

Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof

The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me) Al O where Me is a second metal and 0<x&lE;1, deposited by Physical Vapor Deposition.

PVD coated cutting tool and method of its production

The present invention relates to a process for producing a coated cutting tool consisting of a coating and a substrate, wherein at least one refractory layer consisting of fine-grained, crystalline &ggr;-Al O is deposited by reactive magnetron sputtering onto the moving substrate in a vacuum by pulsed magnetron sputtering in a mixture of a rare gas and a reactive gas at a pulse frequency set for 10 to 100 kHz. The deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate at a magnetron target power density in time average set for at least 10 W/cm . The substrate temperature is in the range 400 to 700&deg; C. and the flux of impinging particles onto each individual substrate is cyclically interrupted.

Method of making a PVD Al2O3 coated cutting tool

Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.

Device for vacuum coating slide bearings

The present invention describes a coated substrate material. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al O , with a grainsize less than 0.1 &mgr;m. The Al O layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450&deg; C. to 700&deg; C., preferably 550&deg; C. to 650&deg; C., depending on the particular substrate material. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the ( ) and ( ) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu radiation identify the &ggr;-phase Al O . The alumina layer is also very strongly textured in the &lsqb;440&rsqb;-direction. The Al O layer is virtually free of cracks and halogen impurities. Furthermore, the Al O layer gives the cutting edge of the tool an extremely smooth surface finish.

The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of a refractory compound of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al,O,, with a grain size of less than 0.1 &mgr;m. The Al,O,layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450&deg; C. to 700&deg; C., preferably 550&deg; C. to 650&deg; C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (,) and (,) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu,radiation identify the &ggr;-phase Al,O,. The alumina layer is also very strongly textured in the &lsqb;(,)&rsqb;-direction. The Al,O,layer is virtually free of cracks and halogen impurities. Furthermore, the Al,O,layer gives the cutting edge of the tool an extremely smooth surface finish.

Process for producing organically modified oxide, oxynitride or nitride

Method and device for pre-treatment of substrates

Electron gun with band-shaped beams that includes a vacuum chamber extend in a longitudinal direction, a beam window running in the longitudinal direction along the vacuum chamber, and a cathode control-electrode system positioned within the vacuum chamber in the longitudinal direction. The cathode control-electrode system includes at least one substantially straight cathode positioned substantially parallel to a longitudinal axis of the cathode control-electrode system and the at least one substantially straight cathode has bulges formed at defined distances. The bulges are shaped to produce a substantially homogeneous current density distribution along the at least one substantially straight cathode and support units are located in the cathode control-electrode system to correspond with the bulges. The bulges are removably couplable to the support units.

Cathode for electron gun with band-shaped beams

Process for ion-supported vacuum coating

Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.

Compound body of vacuum-coated sintered material and process for its

Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.

Vacuum-coated compound body and process for its production

Apparatus for plasma-assisted high rate electron beam vaporization

Growing community of inventors

Dresden, Germany

Siegfried Schiller