Hoechst Aktiengesellschaft

Siegfried Scheler

Gerhard Buhr

Wolfgang Zahn

Klaus Bergmann

Herbert Siegel

Klaus Thoese

Axel Schmitt

Andreas Elsaesser

Hans-Dieter Frommeld

Fritz Erdmann

Helmut Lenz

Heinz Schafer

The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive

A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical and

Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic

The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.

Composition containing naphthoquinone diazide sulfonic acid mixed esters

The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.

Radiation-sensitive ester and process for its preparation

A process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof, of the general formula Z ##STR1## is disclosed in which X=hydrogen, a metal or an ammonium group, preferably an alkali metal or alkaline earth metal, especially sodium or potassium and the ammonium group. The compounds can be used as much or as intermediates or starting materials for the production of light-sensitive compounds and radiation-sensitive mixtures and materials.

Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic

The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,

Radiation-sensitive compounds, radiation-sensitive mixture prepared

The invention relates to a process for preparing 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid esters of the general formula I ##STR1## which are substituted in at least one of the positions 5, 6, 7 or 8 by R=halogen, alkoxy groups or alkoxycarbonyl groups and in which X denotes an aryl group. The process comprises steps in which

Process for preparing substituted

Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A ##STR1## in which R is an alkyl, epoxyalklyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group and

Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes

Disclosed is a two-component diazotype material comprising a support and a light-sensitive layer containing (a) at least one diazonium compound derived from p-phenylenediamine and carrying a basic heterocyclic radical in the 4-position and ether groups in the 2- and 5-positions, (b) a coupler component, and (c) an acid stabilizer, the diazonium compound being present in the form of a benzenesulfonate or toluenesulfonate. The disclosed materials have a good storability and are easily developed.

Two-component diazotype material with diazonium salt with anion of

The present invention relates to a two-component diazotype material comprising a support and one or several light-sensitive layers, each of which contains at least one light-sensitive diazonium salt, a coupler component and an acid stabilizer, and at least one of the layers contains a compound which absorbs light in the ultraviolet spectral region. The light-absorbing compound is present in the form of a dye salt of at least one benzothiazole which is converted into its leuco base under the action of an alkaline medium. It thus partially or completely loses its absorptivity toward radiation in the long-wave ultraviolet and short-wave visible spectral regions. The light-absorbing compound comprises a benzothiazole, in particular according to the general formula: ##STR1## wherein R.sub.1 denotes hydrogen, alkyl or aralkyl,

Two-component diazotype material with ultraviolet light-absorbing dye

This invention relates to a derivative of 2-hydroxy-naphthalene of the general formula ##STR1## wherein A is ##STR2## and X is --OH or ##STR3## and R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are identical or different and are hydrogen, cycloalkyl having up to eight carbon atoms, which is optionally substituted by lower alkyl groups, aralkyl having up to 10 carbon atoms or aryl which is substituted by lower alkyl, lower alkoxy, halogenalkyl or alkyl-substituted amino groups or by halogen, or R.sub.1 and R.sub.2 or R.sub.3 and R.sub.4 in each case are, conjointly with the nitrogen atom to which they are attached, identical or different heterocyclic groups which are optionally substituted by lower alkyl.

Diazotype materials with 2-hydroxy-naphthalene having sulfonamide

A two-component diazotype material, composed of a support and a light-sensitive layer which is applied thereto and contains a polymeric binder, a diazonium salt, a coupler, an acid stabilizer and conventional additives, wherein the support is a biaxially oriented polyester film and the polymeric binder comprises a mixture of about 10-60 percent by weight of a polymer or copolymer of vinyl acetate, for example, a copolymer of vinyl acetate and crotonic acid, and about 40-90 percent by weight of a cellulose ester, such as cellulose acetopropionate, cellulose acetobutyrate, cellulose propionate or cellulose butyrate.

Two-component diazotype material

This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group.

Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid

This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group. The compounds are useful as coupling components for diazo printing.

2-Hydroxy-3-naphthoic acid amides

This invention relates to a recording material containing diazo compounds, in particular a microfilm, comprising a film base which is at least partially pervious to visible radiation, a light-sensitive layer and, on the reverse side of the film base, a filter layer which absorbs light in the long-wave ultraviolet spectral range and in the short-wave visible spectral range, wherein the filter layer is composed of a polymer which is insoluble or has been rendered insoluble by cross-linking, and of at least one yellow to orange-colored dye which is compatible with the constituents of the polymer and absorbs light in the range between about 360 nm and about 500 nm. The invention also relates to a process for the manufacture of a recording material.

Growing community of inventors

Wiesbaden, Germany

Siegfried Scheler