Asml Netherlands B.v.

Siegfried Alexander Tromp

Raymond Wilhelmus Louis Lafarre

Nicolaas Ten Kate

Coen Hubertus Matheus Baltis

Thibault Simon Mathieu Laurent

Martijn Houben

Yuri Johannes Gabriël Van De Vijver

Bert Dirk Scholten

Rogier Hendrikus Magdalena Cortie

Jim Vincent Overkamp

Abraham Alexander Soethoudt

Van Vuong Vy

Johannes Henricus Wilhelmus Jacobs

Koen Steffens

Ruud Hendrikus Martinus Johannes Bloks

Theodorus Wilhelmus Polet

Niek Jacobus Johannes Roset

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Marcus Martinus Petrus Adrianus Vermeulen

Gerben Pieterse

Gijs Kramer

Mark Constant Johannes Baggen

Antonie Hendrik Verweij

Justin Johannes Hermanus Gerritzen

Jan Pieter Van De Poel

Sjoerd Nicolaas Lambertus Donders

Andre Bernardus Jeunink

Nina Vladimirovna Dziomkina

Yogesh Pramod Karade

Adrianus Hendrik Koevoets

Elisabeth Corinne Rodenburg

Jacobus Josephus Leijssen

Günes Nakiboglu

Christianus Wilhelmus Johannes Berendsen

Daan Daniel Johannes Antonius Van Sommeren

Mark Johannes Hermanus Frencken

Hendrik Huisman

Simon Karel Ravensbergen

Nicholas Peter Waterson

Stef Marten Johan Janssens

Maurice Wilhelmus Leonardus Hendricus Feijts

Bas Johannes Petrus Roset

Vincentius Fransiscus Cloosterman

Theresa Mary Spaan-Burke

Peter Mark Overschie

Teunis Van Dam

Bob Streefkerk

Johannes Petrus Martinus Bernardus Vermeulen

Marcel Beckers

Antonius Franciscus Johannes De Groot

Leon Martin Levasier

Thomas Poiesz

Youssef Karel Maria De Vos

Henricus Jozef Castelijns

Koen Gerhardus Winkels

André Schreuder

Frank Pieter Albert Van Den Berkmortel

Satish Achanta

Ilya Malakhovsky

Hubertus Antonius Geraets

Tiannan Guan

Evelyn Wallis Pacitti

Ringo Petrus Cornelis Van Dorst

Peter Schaap

Michael Marinus Anna Steur

Arie Cornelis Scheiberlich

Jelmer Mattheüs Kamminga

Nicolaas Petrus Marcus Brantjes

Michiel Theodorus Jacobus Fonteyn

Daniel Elza Roeland Audenaerdt

Dirk Jerome Andre Senden

Robby Franciscus Josephus Martens

Gerhard Albert Ten Brinke

Thibault Laurent

Johannes Jacobs

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

Rogier Cortie

Maurice Feijts

A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

Substrate support and substrate table

Substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure includes a distal surface that contacts, in use, a substrate being supported. Each burl structure has an opening to at least one of the holes formed through the base member.

Method of manufacturing a substrate support for a lithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Stage system, lithographic apparatus, method for positioning and device manufacturing method

A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Substrate holder, a lithographic apparatus and method of manufacturing devices

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body () having a main body surface; and a plurality of burls () projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature () configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.

A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

Substrate table and lithographic apparatus

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Papendrecht, Netherlands

Siegfried Alexander Tromp