Asml Netherlands B.v.

Carl-zeiss-smt Ag

Siebe Landheer

Ivo Adam Johannes Thomas

Jeroen Peter Johannes Bruijstens

Marcio Alexandre Cano Miranda

Gheorghe Tanasa

Arnout Johannes Meester

Franciscus Johannes Joseph Janssen

Marcel Beckers

Marcus Adrianus Van De Kerkhof

Hans Jansen

Richard Joseph Bruls

Bauke Jansen

Laurentius Catrinus Jorritsma

Maurice Martinus Johannes Van Der Lee

Lambertus Dominicus Noordam

Johan Gertrudis Cornelis Kunnen

Ruud Hendrikus Martinus Johannes Bloks

Frederik Eduard De Jong

Gerald Richter

Chung-Hsun Li

Georgios Tsirogiannis

Maria Johanna Agnes Rubingh

Patricius Jacobus Neefs

Wouterus Johannes Petrus Maria Maas

Dieter Schmerek

Yücel Kök

Hendrik Cornelis Anton Borger

Joachim Schroeder

Si-Han Zeng

Bartholomeus Mathias Van Oerle

Uwe Schubert

Willem Van Schaik

A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

Method and system for determining overlay

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Lithographic apparatus and device manufacturing method

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

Lithographic apparatus and method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.

Lithographic apparatus and method

In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.

System for flushing at least one internal space of an objective

Growing community of inventors

Eindhoven, Netherlands

Siebe Landheer