Semes Co., Ltd.

Si Eun Kim

Jin Ho Choi

Ki Sang Eum

Sun Wook Jung

Byoung Doo Choi

Hee Man Ahn

Seung Han Lee

An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.

Apparatus for treating substrate

An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

Growing community of inventors

Chungcheongbuk-do, South Korea

Si Eun Kim