International Business Machines Corporation

Globalfoundries Inc.

Shyam Parthasarathy

Randy Lee Wolf

Venkata Narayana Rao Vanukuru

Balaji Swaminathan

Ananth Sundaram

A multi-port inductor structure for use in semiconductor applications such as high-performance RF filters and amplifiers is provided. Embodiments of the present invention may provide 3 metallization layers and two via layers. The metallization layers and via layers may be substantially stacked on top of each other to conserve space. Each metallization layer comprises a ring pattern. In embodiments, the top two ring patterns include a plurality of concentric bands, forming a spiral pattern. The third (bottom) ring may include a broken ring pattern. In embodiments, the second (middle) ring may include one or more spans to facilitate connection to the inner bands of the second ring. The spans connect inner bands to an outer perimeter region of the second ring. Multiple tap points along the bands and spans allow multiple inductance values to be obtained from the structure.

Structure and method for high performance multi-port inductor

A variable capacitance semiconductor structure is disclosed. Embodiments include a capacitor having three plates, a top plate, a middle plate, and a bottom plate. The top plate serves as a positive plate. The middle and bottom plates serve as ground plates for the capacitor. A switching circuit selects between the middle plate and the bottom plate for use as the ground plate of the capacitor. The middle plate is slotted, allowing electric fields to penetrate through the middle plate to the bottom plate. The slots prevent the electric fields from terminating at the middle plate. A different capacitance value can be selected, depending on whether the middle plate or bottom plate is selected as the ground plate. Logic circuitry is configured to control the selection of plates to achieve a variety of capacitance values.

Growing community of inventors

Bengaluru, India

Shyam Parthasarathy