Taiwan Semiconductor Manufacturing Comp. Ltd.

Shy-Jay Lin

Burn Jeng Lin

Wen-Chuan Wang

Mingyuan Song

Jaw-Jung Shin

Pei-Yi Liu

Chien-Min Lee

Ming-Yuan Song

Cheng-Hung Chen

Chwen Yu

Jyuh-Fuh Lin

William Joseph Gallagher

Wilman Tsai

Yen-Lin Huang

William J Gallagher

Chin-Hsiang Lin

Jeng-Horng Chen

Hiroki Noguchi

Heng-Hsin Liu

Tung-Ying Lee

Jui-Chung Peng

Jensen Yang

Chen-Hua Douglas Yu

Chun-Hung Lin

Xinyu Bao

Sheng-Chi Chin

San-De Tzu

Yen-Hao Huang

Chien-Hsun Lin

Ming Yuan Song

Yao-Wen Guo

Ru-Gun Liu

Chung-Te Lin

Carlos H Diaz

Tien-I Bao

Tzu-Chiang Chen

Shih-Ming Chang

Hung-Li Chiang

Tung Ying Lee

Tsai-Sheng Gau

Wen-Chun Huang

Chih Wei Lu

Tzung-Chi Fu

Hui-Min Huang

Hung-Chun Wang

Chia-Ping Chiang

Cheng Kun Tsai

Tsung-Chih Chien

Hon-Sum Philip Wong

Shih-Chi Wang

Cheng-Chi Wu

Harry-Hak-Lay Chuang

Hua-Tai Lin

Chih-Ming Ke

Kuei-Hung Shen

Fei-Gwo Tsai

Chien-Hsun Chen

Kai-Tai Chang

Nuo Xu

Te-Chih Huang

Yung-Cheng Chen

Hung-Cho Wang

Wei-Zen Chou

Sheng-Haung Huang

Wei-Yu Su

Wei-Long Wang

Faruk Krecinic

Ching-Chia Lin

Yu-Fang Chiu

Chao-Chung Huang

Kuan-Hao Chen

Chia-Chin Tsai

Chi-Feng Pai

Cheng-Wei Peng

Chen-Yu Hu

Wen Chuan Wang

Tuane Ying Fang

A memory device and a method of manufacturing the same are provided. The memory device includes a semiconductor substrate, an interconnect structure and a memory cell. The interconnect structure is disposed over the semiconductor substrate, and the memory cell is disposed over the interconnect structure and electrically coupled with the semiconductor substrate and the interconnect structure. The memory cell includes a spin Hall electrode layer, an MTJ pillar, a hard mask, and a spacer. The MTJ pillar is disposed on the spin Hall electrode layer, the hard mask is disposed on the MTJ pillar, and the spacer is disposed on sidewalls of the MTJ pillar and the hard mask. Suitably, the spin Hall electrode layer at least comprises an inner portion and an outer portion surrounding the inner portion, and a top surface of the outer portion is lower than a top surface of the inner portion.

Memory cell, memory device and manufacturing method thereof

Semiconductor device includes pair of active devices, composite spin Hall electrode, and a magnetic tunnel junction. Composite spin Hall electrode is electrically connected to pair of active devices. Magnetic tunnel junction is disposed on opposite side of composite spin hall electrode with respect to pair of active devices. Spin Hall electrode includes pair of heavy metal layers, and spacer layer disposed in between pair of heavy metal layers. Pair of heavy metal layers is made of a heavy metal in a metastable state. Spacer layer comprises first material different from the pair of heavy metal layers.

Semiconductor device and manufacturing method of semiconductor device

A magnetic memory device includes a magnetic tunnel junction (MTJ) stack, a spin-orbit torque (SOT) induction wiring disposed over the MTJ stack, a first terminal coupled to a first end of the SOT induction wiring, a second terminal coupled to a second end of the SOT induction wiring, and a selector layer coupled to the first terminal.

Magnetic device and magnetic random access memory

A memory device is provided. The memory device includes a substrate, a spin-orbit torque layer and a magnetic tunneling junction (MTJ). The MTJ stacks with the spin-orbit torque layer over the substrate and includes a synthetic free layer, a barrier layer and a reference layer. The synthetic free layer includes a synthetic antiferromagnetic structure, a first spacer layer and a free layer, wherein the synthetic antiferromagnetic structure is disposed between the spin-orbit torque layer and the free layer. The barrier layer is disposed beside the synthetic free layer. The reference layer is disposed beside the barrier layer.

Memory device

Memory stacks, memory devices and method of forming the same are provided. A memory stack includes a spin-orbit torque layer, a magnetic bias layer and a free layer. The magnetic bias layer is in physical contact with the spin-orbit torque layer and has a first magnetic anisotropy. The free layer is disposed adjacent to the spin-orbit torque layer and has a second magnetic anisotropy perpendicular to the first magnetic anisotropy.

MRAM stacks, MRAM devices and methods of forming the same

A magnetic memory device includes a spin-orbit torque (SOT) induction spin Hall electrode and a free layer of a magnetic tunnel junction (MTJ) stack disposed on the spin Hall electrode which is a synthetic anti-ferromagnetic structure. The free layer has a magnetic moment which is askew of the long axis of the MTJ stack and askew the direction of current flow through the spin Hall electrode. The MTJ stack internally generates a magnetic field to switch the state of the free layer. The free layer includes a first layer separated from a second layer by a spacer layer, where the first layer and the second layer may have the same or different crystalline structures.

Magnetic tunneling junction with synthetic free layer for SOT-MRAM

Provided are a memory device and a method of forming the same. The memory device includes: a selector; a magnetic tunnel junction (MTJ) structure, disposed on the selector; a spin orbit torque (SOT) layer, disposed between the selector and the MTJ structure, wherein the SOT layer has a sidewall aligned with a sidewall of the selector; a transistor, wherein the transistor has a drain electrically coupled to the MTJ structure; a word line, electrically coupled to a gate of the transistor; a bit line, electrically coupled to the SOT layer; a first source line, electrically coupled to a source of the transistor; and a second source line, electrically coupled to the selector, wherein the transistor is configured to control a write signal flowing between the bit line and the second source line, and control a read signal flowing between the bit line and the first source line.

Methods of writing and forming memory device

A magnetic memory device includes a magnetic tunnel junction (MTJ) stack, a spin-orbit torque (SOT) induction wiring disposed over the MTJ stack, a first terminal coupled to a first end of the SOT induction wiring, a second terminal coupled to a second end of the SOT induction wiring, and a shared selector layer coupled to the first terminal.

SOT-MRAM with shared selector

A device includes a substrate having a first side and a second side, a first transistor that includes a first gate over a first protrusion and a first source region and a first drain region interposing the first protrusion, a first buried contact disposed adjacent to the first protrusion and having at least a portion extending into the substrate, a first contact plug disposed over the first drain region, first conductive lines disposed over the first contact plug and electrically connecting to the first drain region by the first contact plug, first via penetrating through the substrate and connecting the first buried contact; and second conductive lines disposed over the second side of the substrate and electrically connecting to the first via. The first buried contact is electrically connecting to the first source region or the first gate.

Semiconductor device and method for forming the same

A memory device includes a substrate, a spin-orbit torque (SOT) layer, a magnetic tunneling junction (MTJ) film stack, a connecting via and a shielding structure. The SOT layer is disposed on the substrate. The MTJ film stack is formed over SOT layer and on the substrate. The connecting via is disposed on and electrically connected to the MTJ film stack. The shielding structure is laterally surrounding the MTJ film stack and disposed on the SOT layer, wherein the shielding structure includes a first dielectric layer, a high magnetic permeability layer and a second dielectric layer, the first dielectric layer is in contact with the SOT layer and the MTJ film stack, and the high magnetic permeability layer is sandwiched between the first dielectric layer and the second dielectric layer.

Memory device and method of fabricating the same

A semiconductor device including a semiconductor substrate and an interconnect structure is provided. The semiconductor substrate includes a transistor, wherein the transistor has a source region and a drain region. The interconnect structure is disposed over the semiconductor substrate, wherein the interconnect structure includes a plurality of interlayer dielectric layers, a first via and a memory cell. The plurality of interlayer dielectric layers are over the semiconductor substrate. The first via is embedded in at least two interlayer dielectric layers among the plurality of interlayer dielectric layers and electrically connected with the drain region of the transistor. The memory cell is disposed over the at least two interlayer dielectric layers among the plurality of interlayer dielectric layers and electrically connected with the first via.

Memory device, semiconductor device, and method of fabricating semiconductor device

The disclosure is directed to spin-orbit torque ('SOT') magnetoresistive random-access memory (“MRAM”) (“SOT-MRAM”) structures and methods. A new structure of the SOT channel has one or more magnetic insertion layers superposed or stacked with one or more heavy metal layer(s). Through proximity to a magnetic insertion layer, a surface portion of a heavy metal layer is magnetized to include a magnetization. The magnetization within the heavy metal layer enhances spin-dependent scattering, which leads to increased transverse spin imbalance.

Magnetic tunnel junction structures and related methods

A method includes depositing a first dielectric layer over a semiconductor substrate, depositing a first electrode layer over the first dielectric layer, etching the first electrode layer to form a first electrode and a second electrode laterally separated from the first electrode, depositing a Spin Orbit Torque (SOT) material on the first electrode and the second electrode, depositing Magnetic Tunnel Junction (MTJ) layers on the SOT material, depositing a second electrode layer on the MTJ layers, etching the SOT material to form a SOT layer extending from the first electrode to the second electrode, etching the MTJ layers to form an MTJ stack on the SOT layer, and etching the second electrode layer to form a top electrode on the MTJ stack.

Semiconductor MRAM device and method

A memory device and a manufacturing method thereof are provided. The memory device includes a magnetic tunneling junction (MTJ) and a spin Hall electrode (SHE). The MTJ includes a free layer, a reference layer and a barrier layer lying between the free layer and the reference layer. The SHE is in contact with the MTJ, and configured to convert a charge current to a spin current for programming the MTJ. The SHE is formed of an alloy comprising at least one heavy metal element and at least one light transition metal element. The heavy metal element is selected from metal elements with one or more valence electrons filling in 5d orbitals, and the light transition metal element is selected from transition metal elements with one or more valence electrons partially filling in 3d orbitals.

Memory device and manufacturing method thereof

A device includes a spin orbit coupling layer and a Magnetic Tunnel Junction (MTJ) stack. The MTJ stack includes a dielectric layer over the spin orbit coupling layer, a free layer over the dielectric layer, a tunnel barrier layer over the free laver, and a reference layer over the tunnel barrier layer. The spin orbit coupling layer extends beyond edges of the MTJ stack in a first direction and a second direction opposite to the first direction.

SOT MRAM having dielectric interfacial layer and method forming same

Growing community of inventors

Jhudong, Taiwan

Shy-Jay Lin