Renesas Electronics Corporation

Shuuichirou Ueno

Tatsuya Usami

Takashi Ogura

Satoshi Kodama

Takamasa Itou

Satoshi Itou

A conductor provided in an interconnection layer is allowed to have a low resistance. An insulator film is provided over a substrate, and is comprised of SiON(where x&#x3e;0.5 in an XRD analysis result). An interconnection is provided over the insulator film, and includes a first layer and a second layer. The first layer includes at least one of TiN, TaN, WN, and RuN. The second layer is provided over the first layer, and is formed of a material having a resistance lower than the first layer, for example, W.

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Ibaraki, Japan

Shuuichirou Ueno