Cambrios Technologies Corporation

Applied Materials, Inc.

Cambrios Film Solutions Corporation

Other

Shuo Na

Florian Pschenitzka

Michael A Spaid

Xina Quan

Haixia Dai

Hash Pakbaz

Jeffrey A Wolk

Michael R Knapp

Adrian Winoto

Jonathan S Alden

Pierre-Marc Allemand

Jelena Sepa

Ilias Iliopoulos

Kelby Yancy

Chunsheng Chen

Bo Zhang

Patrick L Smith

Jeffrey Wolf

Jose Albor

Songfu Jiang

Hash Pakabaz

A method of fabricating a transparent conductor is provided. The method includes forming a nanowire dispersion layer on a substrate, forming a nanowire network layer on the substrate by drying the nanowire dispersion layer, and forming a matrix material layer on the nanowire network layer.

Nanowires-based transparent conductors

A transparent conductor including a conductive layer coated on a substrate is described. More specifically, the conductive layer comprises a network of nanowires that may be embedded in a matrix. The conductive layer is optically clear, patternable and is suitable as a transparent electrode in visual display devices such as touch screens, liquid crystal displays, plasma display panels and the like.

Nanowire-based transparent conductors and applications thereof

A method of fabricating a transparent conductor includes the following steps. The first step is drawing a substrate from a first reel to a second reel along a travelling path, and along the travelling path. Next step is forming a metal nanowire dispersion layer on the substrate and then drying the metal nanowire dispersion layer to form a metal nanowire network layer. Next step is forming a matrix layer on the metal nanowire network layer so as to form a conductive layer of the metal nanowire network layer embedded in the matrix layer.

Systems and methods are provided for determining a clean endpoint time for a current run of a chamber. The clean endpoint time for the current run may be determined by determining that a chamber parameter, such as a chamber pressure, has stabilized. Historical clean endpoint time data is updated by adding the clean endpoint time for the current run of the chamber. A recommended clean endpoint time is then determined for the chamber based on the updated historical clean endpoint time data.

Method and system for identifying a clean endpoint time for a chamber

Embodiments presented herein provide techniques for controlling deposition processes in a process chamber based on monitoring contaminant gas levels in a chamber. Embodiments include generating a data model defining acceptable levels within the chamber for each of a plurality of gas types. Gas levels of the plurality of gas types within the chamber are monitored using one or more sensor devices within the chamber. Upon determining that at least one gas level within the chamber violates the acceptable level for the respective gas type within the data model, embodiments perform a corrective action for the chamber.

Chamber leak and gas contaimination detection

The present invention generally relates to a method for detecting the breakage of one or more grounding straps without stopping processing or opening the processing chamber for inspection. In one embodiment, a method for detecting grounding strap breakage in a processing chamber includes monitoring real-time RF related data from plasma generated in the processing chamber. The method also includes comparing the real-time RF related data with a pre-determined threshold RF related data. The method includes generating an alert if the real-time RF related data meets or exceeds the pre-determined threshold RF related data. In one embodiment, the RF related data includes RF frequency, direct current voltage, voltage peak-to-peak, and/or RF reflected power.

Detection of grounding strap breakage

A method for forming a transparent conductor including a conductive layer coated on a substrate is described. The method comprises depositing a plurality of metal nanowires on a surface of a substrate, the metal nanowires being dispersed in a liquid; and forming a metal nanowire network layer on the substrate by allowing the liquid to dry.

Methods and apparatus for determining substrate integrity and alignment are described. Devices as described herein can include a transfer chamber, one or more process chambers, a loadlock chamber a first optical device, a second optical device and a radiation source positioned outside and above an opening for the loadlock chamber. Methods as described herein can include delivering a substrate to an opening in a process chamber, activating the optical device and the radiation source and capturing a plurality of images, extracting a substrate edge pattern from the plurality of images, comparing the substrate edge pattern to an expected edge pattern to determine a level of edge variance and adjusting or stopping a process if the level of edge variance is outside of an edge variation range.

Application of in-line glass edge-inspection and alignment check in display manufacturing

A method and apparatus for detecting substrate arcing and breakage within a processing chamber is provided. A controller monitors chamber data, e.g., parameters such as RF signals, voltages, and other electrical parameters, during operation of the processing chamber, and analyzes the chamber data for abnormal spikes and trends. Using such data mining and analysis, the controller can detect broken substrates without relying on glass presence sensors on robots, but rather based on the chamber data.

Detecting arcing using processing chamber data

A transparent conductor including a conductive layer coated on a substrate is described. More specifically, the conductive layer comprises a network of nanowires which may be embedded in a matrix. The conductive layer is optically transparent and flexible. It can be coated or laminated onto a variety of substrates, including flexible and rigid substrates.

Growing community of inventors

San Jose, CA, United States of America

Shuo Na