National Chung Hsing University

Shuo-Huang Yuan

Ray-Hua Horng

Dong-Sing Wuu

Tung-Hsing Wu

Po-Wei Chen

Chih-Yi Yang

A method for repairing etching damage on a nitride-based epitaxial layer of an optoelectronic device and an optoelectronic device attributable thereto are provided. The method includes: providing a nitrogen-containing working liquid and a annealing apparatus having a reaction chamber; heating the reaction chamber to a predetermined temperature; atomizing the nitrogen-containing working liquid, and introducing the thus formed nitrogen-containing spray into the reaction chamber; and subjecting the optoelectronic device to an annealing treatment in the reaction chamber in the presence of the nitrogen-containing spray, so as to repair the etching damage on the nitride-based epitaxial layer.

Method for repairing etching damage on nitride-based epitaxial layer of optoelectronic device and optoelectronic device attributable thereto

A large area passive micro light-emitting diode matrix display includes a plurality of micro light-emitting diode matrices and an external circuit component. Each of the micro light-emitting diode matrices includes a first layer, a plurality of light-emitting layers disposed on the first layer, a plurality of second layers disposed on the light-emitting layers, respectively, a plurality of first inner electrode layers disposed on the second layers, respectively, and a second inner electrode layer which is disposed on the first layer, and which includes a first portion and a second portion having a plurality of through holes to accommodate said light-emitting layers, respectively.

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Taichung, Taiwan

Shuo-Huang Yuan