Hitachi-high-technologies Corporation

Shunya Watanabe

Mitsugu Sato

Mami Konomi

Masako Nishimura

Yayoi Konishi

Kaname Takahashi

Akinari Morikawa

Mine Nakagawa

Atsushi Muto

Yuusuke Tanba

Masaki Takano

Shotaro Tamayama

Yoichi Ose

Hiroyuki Noda

Yoshinobu Kimura

Atsushi Takane

Natsuki Tsuno

Hisayuki Takasu

Eiko Nakazawa

Takafumi Miwa

Shinichi Tomita

Atsushi Kamino

Kunji Shigeto

Chisato Kamiya

Noriko Iizumi

Ryuichiro Tamochi

Mine Araki

Atsushi Miyaki

Toru Ishitani

For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.

Charged particle beam apparatus, specimen observation system and operation program

Display screen with graphical user interface

The sampleis tilted/oscillated with respect to the optical axis (Z-axis) of the ion beamto repeat tilt and tilt/restoration of a processing target surfaceof the samplebetween a surface state in which the processing target surfaceof the samplefaces a tilt axis direction (Y-axis direction) and a tilted surface state in which a portion of the processing target surfaceon the sample stage side protrudes in the tilt axis direction (Y-axis direction) than does a portion of the processing target surfaceon the mask side, so that the processing target surfaceis irradiated with the ion beamat a low angle, and projections/recessesderived from a voidor a dissimilar materialare suppressed. Accordingly, it is possible to suppress generation of projections/recesses derived from a void or dissimilar material in fabrication of a cross section sample, and thus fabricate a sample cross section suitable for observation/analysis.

Ion milling device and ion milling processing method

The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.

Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen

A charged particle beam apparatus is provided with a parameter adjustment practice function for allowing any user to easily learn manual focus adjustment and stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.

Charged particle beam apparatus

The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.

Charged particle beam device

There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not a correlation value between them or the dark-field image has a predetermined contrast. According to such a constitution, it is possible to obtain information by which it is judged whether or not the dark-field image has an appropriate atomic number contrast.

Charged particle beam device with DF-STEM image valuation method

Growing community of inventors

Hitachinaka, Japan

Shunya Watanabe