Asahi Glass Company, Limited

Hitachi Chemical Company, Ltd.

Iwaki Glass Co., Ltd.

Shunsuke Yokotsuka

Ko Aosaki

Masahiro Ito

Kazuya Oharu

Atsushi Watakabe

Takeshi Eriguchi

Ikuo Matsukura

Masao Unoki

Kaori Tsuruoka

Norihide Sugiyama

Isamu Kaneko

Katsumi Suzuki

Naoko Shirota

Masashi Matsuo

Shotaro Takenobu

Masaru Yamauchi

Takenori Narita

Masaki Naritomi

Shunichiro Uchimura

Atsuo Hiroi

Fusaaki Takeo

Hiroyuki Morishima

Nobuko Matsunaga

Aya Serita

The present invention relates to an optical waveguide containing: a core formed by curing (A) a fluorine-containing polyarylene prepolymer having a crosslinkable functional group; and a cladding formed by curing (I) a curable composition containing (B) a compound having a molecular weight of 140 to 5,000, having a crosslinkable functional group and having no fluorine atom, and (A) a fluorine-containing polyarylene prepolymer.

Optical waveguide

To provide a prepolymer which is excellent in heat resistance and which can form a cured product excellent in oil repellency and water repellency. A crosslinkable prepolymer having a polyaryl ether structure on its main chain, which has a crosslinkable functional group and a side chain represented by 'Rf-CH&#x2014;O&#x2014;' wherein Rf is a Cfluorinated alkyl group (which may contain an oxygen atom forming an ether bond).

Crosslinkable prepolymer, its production process and its uses

To provide a crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having a low relative permittivity, high heat resistance, low birefringence and high flexibility, and its uses. A crosslinkable fluorinated aromatic prepolymer which is obtained by subjecting a compound (Y-1) having a crosslinkable functional group (A) and a phenolic hydroxyl group and/or a compound (Y-2) having a crosslinkable functional group (A) and a fluorinated aromatic ring, to a condensation reaction in the presence of a HF-removing agent, with a fluorinated aromatic compound (B) represented by the formula (1): (wherein n is an integer of from 0 to 2, each of a and b which are independent of each other, is an integer of 0 to 3, and each of Rfand Rfrepresents a fluorinated alkyl group having at most 8 carbon atoms and a compound (C) having at least 3 phenolic hydroxyl groups, and which has crosslinkable functional groups (A) and ether bonds and has a number average molecular weight of from 1&#xd7;10to 5&#xd7;10.

Crosslinkable fluorinated aromatic prepolymer and its uses

To provide a fluorinated aromatic polymer having excellent heat resistance and a low relative permittivity; and an insulating film for electronic devices and an insulating film for multilayered wiring boards, which are made of the polymer. A fluorinated aromatic polymer which contains two or more crosslinkable functional groups (A) per molecule and has a number average molecular weight of from 1&#xd7;10to 5&#xd7;10and an ether linkage and which is produced by e.g. a method in which a branched fluorinated aromatic compound (B) represented by the formula 1 and a compound (Y1) having a crosslinkable functional group (A) and a phenolic hydroxyl group, are subjected to a condensation reaction in the presence of a HF-removing agent:

Fluorinated aromatic polymer and use thereof

Fluorine-containing resin composition

A low dielectric resin composition comprising the following components (a) and (b), and the dielectric constant of a coating film formed by this composition being at most 3:

Low dielectric resin composition

A fluoropolymer composition for coating, which comprises a polymer having a fluorine-containing cycloaliphatic structure and at least one coupling group in its molecule and a solvent for dissolving said polymer.

Fluoropolymer composition for coating and article coated with the same

A fluorine-containing polymer composition comprising a polymer having a functional group and a fluorine-containing aliphatic cyclic structure dissolved in a solvent mixture of an aprotic fluorine-containing solvent and a protic fluorine-containing solvent.

Fluorine-containing polymer composition

A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.

Process for producing a semiconductor

A fluorine-containing polymer composition comprising a solvent containing a block compound composed of a polyfluorinated segment and a hydrocarbon segment and a fluorine-containing polymer having a fluorine-containing aliphatic cyclic structure dissolved in the solvent.

Growing community of inventors

Tokyo, Japan

Shunsuke Yokotsuka