Ebara Corporation

Shunsuke Matsuzawa

Mitsuru Miyazaki

Junji Kunisawa

Masafumi Inoue

Akira Imamura

A substrate cleaning apparatus comprises: a cleaning memberthat comes into contact with a substrate W and cleans the substrate W; a member rotating unitthat rotates the cleaning member; a pressing drive unitthat presses the cleaning memberagainst the substrate W; a torque detecting unitfor detecting torque applied to the member rotating unit; and a control unitthat controls pressing force on the basis of a result of detection by the torque detecting unit

Substrate cleaning apparatus and substrate processing apparatus

It is an object of the embodiment of the invention to enhance the work efficiency of a substrate transfer test between a plurality of units. A test control section (CPU) which is provided in a loading/unloading unitperforms a substrate transfer test for the loading/unloading unitalone by receiving a wafer mounted on a substrate tableorwhich is installed outside the loading/unloading unitand transporting the wafer into the loading/unloading unitby a transport mechanism or transporting a wafer placed in the loading/unloading unitto a substrate tableand mounting the wafer on the substrate tableby the transport mechanism while the loading/unloading unitis not assembled together with the cleaning unit and the polishing unit.

Growing community of inventors

Tokyo, Japan

Shunsuke Matsuzawa