Tokyo Shibaura Electric Co., Ltd.

Tokyo Shibaura Denki Kabushiki Kaisha

Vlsi Technology Research Association

Shunichi Sano

Ichiro Mori

Toru Tojo

Ryoichi Yoshikawa

Toshiaki Shinozaki

Hirotsugu Wada

Mamoru Nakasuji

Mineo Gotou

Youji Ogawa

Kohichi Kasahara

The dimensions of the cross section of an electron beam emitted from a beam source are changed by deflectors interposed between a pair of aperture masks and are position-corrected by beam position correction deflectors. The electron beam is then irradiated onto a wafer. In accordance with beam dimension signals from a CPU, a correction signal generating circuit supplies correction signals to a beam position correction circuit. The circuit supplies beam position correction signals to the deflectors.

Charged particle beam exposure apparatus

A method of forming by projection an integrated circuit pattern on a first semiconductor wafer, wherein a plurality of reference marks are projected onto a second semiconductor wafer by the irradiation of radiant rays from a projector apparatus used to form the integrated circuit pattern onto the first semiconductor wafer. The positions of the reference marks projected onto the second semiconductor wafer are measured, thereby measuring the projection distortion peculiar to the projector apparatus. As the next step, a projection mask used to form the integrated circuit pattern is produced with the use of the measured projection distortions which has a distortion opposite that of the projector so as to offset its projection distortion. The mark is mounted in the projector apparatus, and the radiant rays are irradiated onto the mask thus projecting the integrated circuit pattern onto the first semiconductor wafer.

Method of forming by projection an integrated circuit pattern on a

An electrostatic chuck plate comprises an electrode plate made of electrically conductive material and a dielectric layer formed on one surface of the electrode plate by flame-spraying dielectric material. The surface region of the dielectric layer is impregnated with plastic material, and the surface of the dielectric layer is smooth and flat. A sample is electrostatically attracted toward the electrode plate and is thus held on the smooth and flat surface of the dielectric layer.

Electrostatic chuck plate

An electron beam type pattern transfer apparatus has a photoelectric mask and a sample in a vacuum container made of non-magnetic material. The photoelectric mask is adapted to receive an ultraviolet ray from a light source and emit photoelectrons corresponding to a predetermined transfer pattern and the sample is disposed in parallel with the photoelectric mask with a predetermined distance left therebetween and illuminated with the photoelectrons to form a resist image thereon which corresponds to the transfer pattern. A power source for applying a voltage for accelerating the photoelectrons emitted is connected between the photoelectric mask and the sample. A pair of focusing magnets are disposed around the axis of the vacuum container such that they are located one at one outer side and one in an opposite outer side of the vacuum container to permit a vertical magnetic field to be created between the photoelectric mask and the sample. The focusing magnets have superconductive coils and are driven in a persistent mode.

Electron beam type pattern transfer apparatus

A method of treating the substrate for a liquid crystal display device to permit unidirectional alignment of the liquid crystal molecules, comprising the steps of forming a silicon dioxide film on the electrode-bearing surface of a substrate, laminating a silicon film on the silicon dioxide film, rubbing the surface of the silicon film in a predetermined direction, and subjecting the substrate a heat treatment.

Method of coating substrate for liquid crystal display device

Disclosed is a system for driving a liquid crystal provided between electrodes disposed within a transparent receptacle in a manner spaced from each other. In order to drive the liquid crystal the electrodes are applied with a square-shaped pulse voltage in which the absolute value of the ratio of the third harmonics wave component amplitude to the fundamental wave component amplitude is below 1/3.

Liquid crystal driving system

A deflection device for use in a color television receiver comprises a deflection yoke fitted to a neck portion of the color television receiver having three horizontally arranged electron guns so designed as to emit three electron beams, for deflecting horizontally and vertically said three electron beams emitted onto a fluorescent screen from the electron guns of the color television receiver, and soft magnetic material pieces fitted to an end portion of the deflection yoke nearer to the screen, for locally varying the distribution of a deflection field generated by the yoke so as to correct mis-convergence of said three electron beams occurring at the peripheral portion of the screen.

Deflection device for use in color television receiver

A color television receiver comprising a color television receiving tube which is provided with three horizontally arranged electron guns so designed as to emit three electron beams and cause said beams to be converged at a point outside of the fluorescent screen of the color television receiving tube; a deflection yoke fitted to the color television receiving tube and so constructed as to cause a horizontal deflection magnetic field created by said yoke to display a pincushion-shaped intensity distribution and a vertical deflection magnetic field produced thereby to present a barrel-shaped intensity distribution; and a delay circuit for causing at least two of the three primary color signals of color television which modulate the three electron beams to be successively delayed from the foremost one at the rate of a prescribed length of time corresponding to the intervening spacing of the three electron beams impinging on the fluorescent screen of the color television receiving tube.

Growing community of inventors

Zama, Japan

Shunichi Sano