Hitachi-high-technologies Corporation

Hitachi, Ltd.

Hitachi High-tech Corporation

Pi R&d Co., Ltd.

Nomura Research Institute, Ltd.

Other

Renesas Electronics Corporation

Shunichi Matsumoto

Toshifumi Honda

Yuta Urano

Masahiro Watanabe

Hidetoshi Nishiyama

Takahiro Jingu

Yasuhiro Yoshitake

Minori Noguchi

Takanori Ninomiya

Yoshimasa Ohshima

Yukio Kembo

Yoshio Morishige

Shuichi Chikamatsu

Yuko Otani

Keiji Sakai

Hisato Nakamura

Ryouji Matsunaga

Atsushi Taniguchi

Tetsuya Watanabe

Hiroshi Itatani

Masami Makuuchi

Taketo Ueno

Yukihiro Shibata

Mamoru Yasuda

Takehiro Tachizaki

Nobuhiro Obara

Takuma Ishibashi

Eiji Arima

Takuharu Mizoguchi

Hayato Takabatake

Eiji Nabika

Takaya Higashino

Masaya Yamamoto

Akira Hamamatsu

Hideaki Sasazawa

Hiroaki Shishido

Tohishiko Nakata

Norio Hasegawa

Takeshi Kato

Toshiharu Miwa

Keiko Oka

Hiromichi Yamakawa

Hisaaki Kanai

Yuji Takagi

Maki Tanaka

Chie Shishido

Hidetoshi Morokuma

Kazuo Aoki

Osamu Komuro

Takashi Iizumi

Yoshiyuki Miyamoto

Akihiro Iwamatsu

Keiya Saito

Kana Nemoto

Tetsuyai Watanabe

Tarou Itatani

Sucheta Gorwadkar

Tsunenori Sakamoto

Masanori Komuro

A defect inspection device in which an optical axis of a detection optical system is inclined with respect to a surface of a sample, and an imaging sensor is inclined with respect to the optical axis, a height variation amount of an illumination spot in a normal direction of the surface of the sample is calculated based on an output of a height measuring unit, a deviation amount of the focusing position with respect to the light receiving surface in an optical axis direction of the detection optical system is calculated based on the height variation amount of the illumination spot, the deviation amount of the focusing position being generated accompanying a height variation of the illumination spot, and the focus actuator is controlled based on the deviation amount of the focusing position, and scattered light intensities at the same coordinates of the sample are added.

Defect inspection device

A defect inspection apparatus includes an illumination unit configured to irradiate a surface of a sample with a linear illumination spot; a condensing detection unit configured to condense reflected light of the illumination spot and to control a polarization state of the incident light to form an optical image; and a sensor unit configured to output the optical image and including an array-shaped light receiving portion and an antireflection film at a position conjugate with the illumination spot, in which the condensing detection unit includes a polarization control unit configured to increase light incident efficiency to the sensor unit. The normal line of the light receiving surface of the sensor unit is inclined from the optical axis of the condensing detection unit by 10 degrees or more and less than 80 degrees. The light condensing detection unit increases the optical magnification in the lateral direction of the illumination spot.

Defect inspection apparatus and defect inspection method

A defect inspection apparatus including illumination optical system configured to irradiate a sample with an illumination spot; a detector arrangement configured to detect, from a plurality of directions, reflected light from the sample; a scanning controller configured to control a scan of the sample with the illumination spot by overlapping detection regions such that the detection regions partially overlap; and a signal processor configured to process a signal obtained by detecting the reflected light from the sample by the detection unit to detect a defect. The signal processor is configured to synthesize an integrated signal by processing the signal detected a plurality of times by overlapping the reflected light of the sample for each detection region by the detection unit; and to detect the defect on a surface of the sample based on the synthesized integrated signal.

A defect inspection device includes an illumination unit that irradiates a sample with a linear illumination spot; a condensing detection unit that condenses reflected light of the illumination spot from the sample; and a sensor unit that forms an optical image on a light reception surface, and outputs the optical image as an electrical signal. An angle α formed between an optical axis of the condensing detection unit and a longitudinal direction of the linear illumination spot is 10° or more and less than 80°. The sensor unit is a line sensor provided with an array-like light reception unit at a position conjugate with the illumination spot. An angle β formed between direction of the line sensor and the optical axis of the condensing detection unit is 10° or more and less than 80°, and has a difference from the angle α of 5° or more.

Defect inspection device and defect inspection method

An object of the invention is to provide a defect inspection device capable of correcting image forming position deviation due to displacement of a sample surface in a Z direction while enabling image forming detection from a direction not orthogonal to a longitudinal direction of illumination. The defect inspection device according to the invention is configured to determine on which lens in a lens array scattered light is incident according to a detection elevation angle of the scattered light from a sample, and an image position of the scattered light having a small elevation angle is corrected more than an image position of the scattered light having a large elevation angle.

This illumination optical system has a laser light source (), a light collection optical system (), and a support structure () that is able to secure the laser light source and the light collection optical system, wherein the light from the laser light source is focused onto an object to be inspected (). The light collection optical system includes a cylindrical mirror (), and at least one cylindrical lens (G). The cylindrical mirror is an optical element that collects light in a first direction, and the cylindrical lens is an optical element that collects light in a second direction perpendicular to the first direction. The focal distance of the cylindrical lens to the object to be inspected is greater than the focal distance of the cylindrical mirror to the object to be inspected.

Lighting optical system and substrate inspecting device

This defect inspection device for emitting illumination light onto a moving and rotating sample and inspecting for sample defects by scanning the sample in a spiral shape or concentric circle shapes comprises: an illumination and detection unit comprising an emission optical system and a detection optical system; a rotary stage for rotating the sample; a rectilinear stage for rectilinearly moving the rotary stage; and a controller for controlling the illumination and detection unit, rotary stage, and rectilinear stage. On the linear path of the rectilinear stage are a scanning start position where illumination light is emitted onto the sample and scanning is started and a sample delivery position where movement of the sample to the scanning start position starts. When the sample arrives at the scanning start position, the defect inspection device starts emitting the illumination light onto the sample without waiting for the rotation speed of the rotary stage to rise to a specified rotation speed for scanning and raises the rotation speed of the rotary stage to the specified rotation speed while scanning the sample.

An inspection device includes an illumination optical system that irradiates a sample with light having a predetermined wavelength, a detection optical system that includes a photoelectric conversion unit, and a data processing unit that extracts positional information of a foreign substance or a defect on the sample. The light collection optical system includes a polarized light transmission control unit that changes transmission characteristics according to polarization characteristics of the collected reflected light or scattered light. The polarized light transmission control unit includes a birefringence phase difference control unit that causes a predetermined phase difference between a fast phase axis and a slow phase axis of the reflected light or scattered light according to the polarization characteristics of the reflected light or scattered light, and a polarized light transmission unit that selectively transmits light according to a polarization direction of output light of the birefringence phase difference control unit.

Defect inspection device and inspection method, and optical module

A defect detection device including an illumination optical system, an image capturing optical system configured to capture an image of scattered light generated by the illumination optical system irradiating the wafer, and an image processing unit configured to process a picture of the image of the scattered light to extract a defect on the wafer. The image capturing optical system includes an objective lens, a filter unit configured to shield a part of light transmitted through the objective lens, and an imaging lens configured to form an image of light transmitted through the filter unit. The filter unit includes a first microlens array configured to condense parallel light transmitted through the objective lens, a shutter array including a light transmission unit at a focus position of the first microlens array, and a second microlens array disposed opposite to the first microlens array with respect to the shutter array.

Defect detection device, defect detection method, and defect observation apparatus including defect detection device

An operation verifying apparatus of a first embodiment acquires a log indicating the content of a sequence of operations performed on a predetermined device, identifies corresponding functions from the log, and automatically generates a program based on the identified functions. Input data, which is to serve as an argument of each of these functions, is set. Execution sets as well as test scenarios are each structured by combining a program and input data. Then each execution set is continuously executed. As a result, an operation test using a test program is executed.

Operation verifying apparatus, operation verifying method and operation verifying system

An inspection device capable of inspecting a foreign matter even during rotation acceleration/deceleration of an object under inspection. The inspection device includes a rotation-and-translation unit configured to rotate and translate the object under inspection; a light intensity modulation unit configured to modulate intensity of laser light to irradiate the object under inspection; a light intensity control unit configured to control the light intensity modulation unit; an object-under-inspection-operation detection unit configured to calculate information about a linear speed at a laser irradiation position on the object under inspection; a data processing unit configured to start foreign matter and defect inspection when a rotation speed of the object under inspection reaches a predetermined speed and a rotation-and-translation control unit configured to determine a time required for a next single rotation of a rotation stage, and apply, to a translation stage, a translation control value for moving the translation stage.

Inspection device and inspection method thereof

A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

The invention includes a pulse oscillated light source, an illumination unit that guides light output from the light source to a sample, a scanning unit that controls a position at which the sample is scanned by the illumination unit, a light converging unit that converges light reflected from the sample, a first photoelectric conversion unit that outputs an electric signal corresponding to the light converged by the light converging unit, an AD conversion unit that converts the electric signal output from the first photoelectric conversion unit into a digital signal in synchronization with pulse oscillation of the light source, a linear restoration unit that processes a digital signal converted by the AD conversion unit in synchronization with a pulse oscillation output by the AD conversion unit and corrects nonlinearity of the first photoelectric conversion unit, a defect detection unit that detects a defect of the sample based on an output of the linear restoration unit, and a processing unit that obtains and outputs a position and a size of the defect detected by the defect detection unit.

An inspection device has an illuminating optical system for forming an illuminated area on a sample, a converging optical system for converging the light from the sample, and a detector for detecting the light converged by the converging optical system. The converging optical system includes an image forming element that includes a lens group that has divided apertures and is configured so as to form a plurality of images. The detector detects a signal for the images formed by the image forming element. The detector has a plurality of partitions disposed in a matrix, the partitions include first and second pixels, and the images are projected onto the partitions.

Inspection device and detector

Growing community of inventors

Yokohama, Japan

Shunichi Matsumoto