Fuji Photo Film Company, Limited

Fujifilm Corporation

Shunichi Kondo

Mitsumasa Tsuchiya

Hideo Sato

Tsuguo Yamaoka

Kenji Sano

Yoshimasa Aotani

Toshiaki Aoai

Kenichiro Sato

Hiroyuki Yoneyama

Kazuto Kunita

Yasuo Okamoto

Toshifumi Inno

Sadao Ishige

Akira Umehara

Takekatsu Sugiyama

Fumikazu Kobayashi

Hiroyuki Nagase

Osamu Sawanobori

A hardcoat laminate including: a support formed from a thermoplastic resin composition; and a hardcoat layer formed from a hardcoat layer forming coating composition, wherein the thermoplastic resin composition contains a polymer having a lactone ring unit or a glutaric anhydride unit, and the hardcoat layer forming coating composition contains at least a component (a), a component (b) and a component (c) and contains substantially no organic solvent: (a) a curable compound having three or more polymerizable groups within one molecule, (b) a polymerization initiator, and (c) a diluent having from one to three polymerizable groups within one molecule.

Hardcoat laminate

An optical film includes a transparent support; and a hardcoat layer that is a layer formed by curing a coating solution containing (A) an octa- to pentadeca-functional urethane (meth)acrylate-based compound having a molecular weight of 800 to 2,000 and having two or more urethane bonds in its molecule, and a photopolymerization initiator.

Optical film, antireflection film, and polarizing plate and display device using the same

A light-sensitive lithographic printing plate precursor comprising an aluminum support having an anodized film on both surfaces thereof and a photo-polymerizable light-sensitive layer on one side of the support, wherein the anodized film on the surface of the support opposite to the light-sensitive layer side is provided on the entire surface and an amount of the anodized film is 0.5 g/mor more.

Light-sensitive lithographic printing plate precursor

A plate-making method of a lithographic printing plate comprising exposing imagewise a photosensitive lithographic printing plate comprising an aluminum support and a photosensitive layer comprising a photosensitive composition of photopolymerization type, which contains a compound having a nitrogen atom and an ethylenically unsaturated double bond, a photopolymerization initiator and a polymer binder, and developing the exposed printing plate with a developing solution containing (1) an inorganic alkali agent and (2) a nonionic surface active agent having a polyoxyalkylene ether group.

Plate-making method of lithographic printing plate

The present invention relates to a presensitized plate useful for making a lithographic printing plate comprising an intermediate layer and a photopolymerizable photosensitive layer on an aluminum substrate in this order, wherein the roughness of a surface of said aluminum substrate (Ra) is in the range of 0.2 to 0.55 &mgr;m and the intermediate layer comprises a polymer compound comprising at least one monomer unit having a sulfonic acid group and a method for making a lithographic printing plate by imagewise exposing the presensitized plate described above and developing the imagewise exposed presensitized plate with a developer comprising an inorganic alkali salt and a nonionic surfactant comprising a polyoxyalkylene ether group. The presensitized plate or the method of the present invention provides a lithographic printing plate showing good contrast between an image area and non-image area, no background contamination during printing, good stability with time and good printing durability.

Presensitized plate useful for making lithographic printing plate and method for making lithographic printing plate therefrom

A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photo-sensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 &mgr;m/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 &mgr;m/s or less.

Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate

Disclosed is a positive resist composition which ensures, on use of an exposure light source of 220 nm or less, high sensitivity, good resolution, sufficiently high resistance against dry etching, satisfactory adhesion to the substrate, and superior developability even with a developer conventionally used for resists (for example, a 2.38% aqueous tetramethylammonium hydroxide solution), the positive resist composition comprising a compound generating an acid on irradiation of an active light ray or radiation, a resin having a polycyclic-type alicyclic group and a carboxyl group, and a compound having at least two groups having a specific structure.

Positive resist composition

A photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenic unsaturated double bond, a specific sensitizing dye represented by the following formula (I), and a titanocene compound: ##STR1## The substituents in formula (I) are defined in the specification.

Photopolymerizable composition containing a sensitizing dye and a

A positive-working light-sensitive composition comprises a diazonium salt represented by the following general formula (I) and an alkali-soluble polymer: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkyl group having 3 to 18 carbon atoms; R.sup.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted phenoxy group or a halogen atom; A represents an organic group; X.sup.-- represents a counterion or an anion; n is an integer ranging from 1 to 4 and m is an integer ranging from 1 to 3, provided that the sum of n and m is equal to 4. The positive-working light-sensitive composition has high sensitivity and can ensure the formation of clear images.

Positive-working light-sensitive composition containing diazonium salt

A positive-working light-sensitive composition whose solubility in a developer is increased by irradiation of light, which comprises:

Light-sensitive composition

A photoconductive composition and an electrophotographic light-sensitive material using the photoconductive composition are described. The photoconductive composition comprises a photoconductive substance and a water-insoluble linear polyester copolymer wherein the polyester copolymer contains a constituent repeating unit derived from terephthalic acid and a straight .alpha.,.omega.-diol component, and the diol component contains at least three compounds selected from the group of ethylene glycol, diethylene glycol, triethylene glycol, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, and 1,6-hexanediol. The electrophotographic light-sensitive material comprises a support and a layer of the above photoconductive composition on the support.

Photoconductive composition and electro-photographic light-sensitive

A photoconductive composition is disclosed which contains an organic photoconductor and a vinylidene chloride-acrylonitrile copolymer. Furthermore, there is disclosed an electrophotographic photoreceptive material using such a photoconductive composition as its photoreceptive layer. The material has improved flexibility while maintaining desirable electrophotographic characteristics.

Growing community of inventors

Shizuoka, Japan

Shunichi Kondo