Sumitomo Special Metals Co., Ltd.

Nakata Manufacturing Co., Ltd.

Shunichi Haruyama

Osamu Yamashita

Feizhou Wang

Tomoyasu Nakano

Tsunekazu Saigo

Takeyuki Sato

Jilong Yin

Nobuhiro Sadatomi

A silicon based conductive material based on a semiconductor silicon and having an electric resistivity of 10 (&OHgr;&middot;m) or less at ambient temperature which has been unattainable heretofore, while facilitating production and handling. An electric resistivity of 10 (&OHgr;&middot;m) or less, which is common for conductors can be realized by adding relatively large quantities of various kinds of elements to silicon. The conductive material can be provided in a semiconductor silicon substrate in a desired pattern by ion beam implantation and patterning. It can be employed not only in the form of a substrate, a rod or a wire, but also in the form of fine particles dispersed in a resin or glass to be employed in various applications requiring conduction, including a conductive sheet material.

Silicon based conductive material and process for production thereof

Growing community of inventors

Osaka, Japan

Shunichi Haruyama