Asahi Glass Company, Limited

Shujiro Watanabe

Eiichi Ando

Takuji Oyama

Satoru Takaki

Junichi Shimizu

Hisashi Osaki

A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent electric power is supplied to the target.

Methods for producing functional films

A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.

Method of an apparatus for sputtering

Sputter coating power processing portion

Growing community of inventors

Yokohama, Japan

Shujiro Watanabe