Adtec Plasma Technology Co., Ltd.

Adtec Corporation

Other

Max-Planck-Gesellschaft Zur F&#xf6;rderung Der Wissenschaften E. V.

Hitachi-Kokusai Electric Inc.

Adtec Europe Limited

Shuitsu Fujii

Gregor Eugen Morfill

Noriyoshi Sato

Tetsuji Shimizu

Bernd Steffes

Takeshi Taniguchi

Takuya Urayama

Kazunari Fujioka

Hiroshi Mase

Raju Ramasamy

Tamiya Fujiwara

Katsumi Oi

Gregor Morfill

A resonator bodycomprises a square-tube-shaped side wallwith upper and lower walls. A cavityis formed in the resonator body. The side wall has a microwave supply opening. A wave guideis connected to the microwave supply opening through an inductive window. The upper and lower walls have reaction tube attachment openings,. A reaction tubeis attached to the reaction tube attachment openings and extends vertically through the cavity and cross an axis of the wave guide. Square tubes-made of non-magnetic metal meshes are arranged concentrically to the resonator body and in nested manner in the cavity at a distance from both the interior surface of the side wall and the reaction tube.

Cavity resonator of microwave plasma generating apparatus

A coaxial microwave plasma torch, comprising, an outside conductor () formed in a cylindrical shape, a cylindrical electric discharge tube () fixedly inserted into an axial hole () formed in the outside conductor on one end face () side, and a coaxial cable () having one end fitted to the other end face of the outside conductor. An antenna () electrically connected to an inside conductor () is fitted to the one end of the coaxial cable and extended into the electric discharge tube through a through-hole () axially passed through between the other end face () of the outside conductor and the bottom face of the axial hole. The outside conductor () of the coaxial cable is electrically connected to the outside conductor, and a gas inlet pipeline () supplying a gas into the electric discharge tube is fitted in the outside conductor.

Coaxial microwave plasma torch

A plasma source, particularly for disinfection of wounds, comprising: an ionization chamber having an inlet for introducing a gas into the ionization chamber and further having an outlet for dispensing the ionized gas onto an object; several ionization electrodes being disposed within the ionization chamber for ionizing the gas and a predetermined ratio of the electrode-electrode distance on the one hand and the electrode-wall distance on the other hand, wherein the ratio is in a range approximately between about 1.8 and about 2.2.

Plasma source

To provide a generator capable of generating plasma and ozone with high efficiency and easy to handle, with a simple structure. An electrode partis formed of electrodesandwithout dielectric material interposed therebetween. An arc-extinguishing capacitoras a charge storage part for storing charge is connected in series to the electrode part. An AC power sourcegenerating plasma by causing self-arc-extinguishing discharge between the electrodesandby applying AC voltage to charge and discharge the arc-extinguishing capacitor, is connected to both ends of a circuit in which the electrode partand the arc-extinguishing capacitorare connected in series. The arc-extinguishing capacitorand one electrodeof the electrode partconnected thereto are unitized, for making the electrode part multi-polarized. A unit is constituted of a floating electrode serving as both of the one electrodeof the electrode partand one electrode of the arc-extinguishing capacitor, an insulating material provided around the floating electrode and a grounding electrode provided around the insulating material.

Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device

The arrangement comprises an antenna coil disposed close to a cover 4 for a Plasma forming chamber 3 and having one side surface opposed to the chamber space of said plasma forming chamber, a magnetically permeable core 7 of ferromagnetic material whose lower surface opposed to said chamber space is formed with a groove 7a in which the conductor of said antenna coil is received, and a susceptor 16 disposed in the lower region of said chamber space for placing an object to be treated 19 thereon.

Plasma source for generating inductively coupled, plate-shaped plasma,

The invention provides an impedance matching and power control system not resorting to mechanical control for a device for high frequency plasma treatment. An impedance matching unit 14 inserted in the terminal end of a power feed line 3 extending from a high frequency power oscillator 1 to a plasma chamber 2 comprises phase detecting means 17, a load-associated detector 19 having the function of detecting voltage, current, and phase angle, and an arithmetic and output section 21, whereby the impedance matching unit delivers a frequency control signal corresponding to the detected phase and a power signal representing the consumed power of the plasma chamber as calculated from the voltage, current and phase angle. The high frequency power oscillator comprises an oscillation control section 24 for controlling the oscillation frequency thereof according to said frequency control signal, and an output control section including a summing amplifier 25 which receives an external set power signal and the detected power signal to find the difference between the two values of power, thus controlling its own output power according to the difference.

System for impedance matching and power control for apparatus for high

Growing community of inventors

Hiroshima, Japan

Shuitsu Fujii