Asml Netherlands B.v.

Shufeng Bai

Jen-Shiang Wang

Guangqing Chen

Yen-Wen Lu

Youping Zhang

Eric Richard Kent

Jan Wouter Bijlsma

Paul Anthony Tuffy

Gertjan Zwartjes

Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than 'building' the device geometry element-by-element.

Process based metrology target design

A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality.

Method and apparatus for design of a metrology target

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San Carlos, CA, United States of America

Shufeng Bai