Boe Technology Group Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Shuang Sun

Fangzhen Zhang

Jing Niu

Kuanjun Peng

Seungjin Choi

Zhijun Lv

Jintao Peng

Zhanfeng Cao

Wei Qin

Ce Ning

Yanan Niu

Xiaolong Li

Yonglian Qi

Zhenyu Zhang

Tao Gao

Lubin Shi

Chunfang Zhang

Wenlin Zhang

Xueling Gao

Tingting Zhou

Jinyu Ren

Shengnan Li

Tailiang Li

Jinqian Wang

Choi-Seung Jin

Dongcan Mi

Miaomiao Yang

A pixel circuit includes a plurality of driving transistors and a plurality of gating sub-circuits. The plurality of driving transistors are configured to output different driving currents under control of a received control signal. Each gating sub-circuit is electrically connected to a respective selection signal terminal, a scanning signal terminal, a respective driving transistor and a light-emitting device, and is configured to be turned on under control of a scanning signal from the scanning signal terminal and a selection signal from the selection signal terminal to transmit a driving current from the connected driving transistor to the light-emitting device. Within a frame period, one of a plurality of selection signal terminals respectively electrically connected to the plurality of gating sub-circuits outputs a selection signal.

Pixel circuit and driving method therefor, display panel, and display apparatus

Embodiments of the present disclosure provide a flexible sensor, including a flexible substrate; a plurality of ultrasonic detectors, on the flexible substrate; and a plurality of detection circuits, respectively corresponding to the ultrasonic detectors; wherein each of the detection circuits is between the flexible substrate and the corresponding ultrasonic detector, and configured to drive the ultrasonic detector to emit an ultrasonic wave, and detect a detection signal output by the ultrasonic detector after receiving the ultrasonic wave; each of the ultrasonic detectors includes: a first electrode coupled to the corresponding detection circuit, a second electrode on a side of the first electrode away from the flexible substrate, and a piezoelectric induction layer between the first electrode and the second electrode; a plurality of holes are provided in a region other than a region where the detection circuits are located.

Flexible sensor

The present disclosure provides a display substrate and a display device. The display substrate includes a pixel circuit, and the pixel circuit includes a light-emitting element, a driving circuit and a capacitor circuit. The driving circuit is configured to drive the light-emitting element to emit light; a first terminal of the capacitor circuit is electrically connected to a control terminal of the driving circuit, and a second terminal of the capacitor circuit is electrically connected to a data writing-in node; the capacitor circuit includes at least two capacitors connected in parallel with each other.

Display substrate and display device

A method of fabricating a micro light emitting diode (micro LED) display substrate. The method includes forming a definition layer on a growth substrate for defining a plurality of subpixel areas, the definition layer formed to include a plurality of lateral walls, each of the plurality of subpixel areas surrounded by a respective one of the plurality of lateral walls; forming a plurality of semiconductor layers of a plurality of micro LEDs on the growth substrate in the plurality of subpixel areas defined by the definition layer; transferring the plurality of semiconductor layers of the plurality of micro LEDs on the growth substrate onto a target substrate; and removing the growth substrate from the plurality of semiconductor layers of the plurality of micro LEDs transferred onto the target substrate.

Method of fabricating a micro light emitting diode display substrate, and micro light emitting diode display substrate

A semi-transparent semi-retroreflective film and an air display device are provided. The air display device includes: a first polarizer and a second polarizer assembled with each other to form a cell; a semi-transparent semi-reflective structure and a semi-transparent semi-retroreflective film disposed between the first polarizer and the second polarizer; a first &#xbc; wave plate disposed at a side of the air display device adjacent to the first polarizer; and a second &#xbc; wave plate disposed between the semi-transparent semi-reflective structure and the semi-transparent semi-retroreflective film. The air display device is configured such that polarized light incident from the first polarizer, after being processed by an internal optical path of the air display device, exits from the second polarizer to form an air image at a side of the air display device away from the first polarizer.

Semi-transparent semi-retroreflective film and air display device

A display substrate, a manufacturing method thereof, and a display device. The manufacturing method of a display substrate includes: providing a substrate; and forming, on the substrate, a first thin film transistor including a first active layer and a second thin film transistor including a second active layer. The second active layer includes a central area and doped regions located at two sides of the central area, respectively. Forming a first thin film transistor including a first active layer and a second thin film transistor including a second active layer on the substrate includes forming the first active layer and the doped regions of the second active layer using a single mask.

Display substrate, manufacturing method thereof, and display device

The disclosure discloses a thin film transistor, a method for fabricating the same, and a display device so as to avoid a source and a drain from being oxidized while the thin film transistor is being fabricated, to thereby improve the performance of the thin film transistor. The method for fabricating a thin film transistor includes: forming an active layer pattern on a base substrate, and a source-drain metal layer located above the active layer pattern and with a same pattern as the active layer pattern, using one patterning process; forming a first insulation layer above the source-drain metal layer; and patterning the source-drain metal layer and the first insulation layer using one patterning process so that portion of the active layer pattern corresponding to a channel area is exposed to form a source pattern and a drain pattern.

Thin film transistor, method for fabricating the same, and display device

A touch panel, a manufacturing method thereof and a display device are provided. The touch panel includes a first touch electrode, a second touch electrode and a one-piece insulating element. The second touch electrode includes an electrode section disposed in a same layer as the first touch electrode and a connecting section under the electrode section. The electrode section includes a first electrode section and a second electrode section, which are electrically connected by the connecting section, and the connecting section is spaced apart from the first touch electrode. The insulating element includes a first insulating section between the connecting section and the first touch electrode and a second insulating section between the first electrode section and the first touch electrode and also between the second electrode section and the first touch electrode. The insulating sections can be obtained by performing a patterning process, so that the manufacturing method of the touch panel is simplified.

Touch panel, manufacturing method thereof, and display device

Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

Array substrate and method of manufacturing the same, and display device

Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

Display substrate

The present disclosure provides an array substrate, its manufacturing method, and a display device. The method includes steps of forming a passivation layer on a base substrate, and forming a contact layer and a pixel electrode on the base substrate with the passivation layer through a single patterning process. The contact layer is made of an identical transparent conductive material to the pixel electrode.

Array substrate, its manufacturing method, and display device

A method for manufacturing an array substrate, comprising forming a pattern of a gate electrode by one pattering process; forming a gate insulating layer on a substrate provided with the pattern of the gate electrode; forming first and second patterns thereon, in which the first pattern corresponds to a pattern of a semiconductor active layer and the second pattern corresponds to a source electrode and a drain electrode; forming a pattern layer including an opening area on the substrate provided with the second pattern, in which the opening area corresponds to a gap between the source electrode and the drain electrode, the minimum width thereof being greater than the width of the gap between the source electrode and the drain electrode, and at least forming a pattern of the source electrode and the drain electrode and a pixel electrode electrically connected with the drain electrode through the opening area.

Array substrate, manufacturing method thereof and display device

The present invention has disclosed a touch screen, comprising: a substrate; at least one first electrode formed on the substrate; at least one second electrode formed on the substrate, the first electrode and the second electrode having different extending directions, and there being an intersecting area between a vertical projection of the first electrode on the substrate and a vertical projection of the second electrode on the substrate; and a first protection layer formed at least at the intersecting area between the first electrode and the second electrode; wherein, the substrate is provided with a groove at the intersecting area between the first electrode and the second electrode so as to at least receive therein a portion of the first electrode located within the intersecting area. The present invention has also disclosed a display device and a method for manufacturing the touch screen. The present invention is provided to prevent two electrodes in two different layers from electrically contacting with each other and to ensure the yield of the touch screen to some extent.

Touch screen, method for manufacturing the same, and display device

The present invention provides an array substrate and a manufacturing method thereof and a display device. The manufacturing method comprises: forming a pattern including a pixel electrode and a source of a thin film transistor on a base substrate through a single patterning process, the pixel electrode is provided in a layer under a layer in which the source is located; forming a pattern including a drain, an active layer, a gate insulation layer and a gate of the thin film transistor through a single patterning process, the active layer covers the source and the drain, and is separated from the gate through the gate insulation layer; and forming a pattern including a passivation layer, a common electrode and a gate line through a single patterning process, the common electrode is a slit electrode and separated from the active layer and the pixel electrode through the passivation layer.

Manufacturing method of array substrate, array substrate and display device

A preparation method of a poly-silicon thin film transistor (TFT) array substrate and an array substrate thereof are provided. The preparation method includes: forming a photoresist layer on a poly-silicon layer, and exposing and developing the photoresist layer with a gray tone mask to form patterns of a photoresist completely-reserved region, a photoresist partially-reserved regions and a photoresist completely-removed region; removing part of the poly-silicon layer located in the photoresist completely-removed region, to form patterns of active layers; ashing the photoresist so as to expose part of the active layer located in the photoresist partially-reserved regions and inject P+ ions of high concentration into the part of the active layer, to form doping regions of patterns of source-drain electrodes of a P-type TFT; and stripping off remaining photoresist.

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Beijing, China

Shuang Sun