Nagase Co., Ltd.

Ishikawajima-harima Heavy Industries Co., Ltd.

Bhp Steel (jla) Pty. Ltd.

Nagase Cms Technology Co., Ltd.

Other

Hirama Laboratories Co., Ltd.

Hirama Rika Kenkyujo Ltd.

Hirama Rika Kenkyujio Ltd.

Shu Ogawa

Toshimoto Nakagawa

Makoto Kikukawa

Satoru Morita

Shiro Osada

Yuko Katagiri

Kouzo Tsukada

Takahiro Hozan

Heiji Kato

Shuzo Takahashi

Takahiro Houzan

Shinichiro Shiotsu

Yasuyuki Kobayakawa

Yoshitaka Nishijima

Atsushi Hirata

Kunio Matsui

Osamu Takeuchi

Ryo Akiyoshi

Mitsumoto Nakagawa

Kiyoshi Kamibayashi

Hideo Nagase

Yoshitaka Sato

Koichi Fujita

Yutaka Saito

Masayoshi Hori

Yoshiya Kitagawa

A casting roll unit (U) with side weirs () and a delivery nozzle () being detachably attached thereto is fixed at a casting position. Side-weir and delivery-nozzle preheating furnaces () are arranged away from the casting roll unit (U). Arranged adjacent to the roll unit (U) are replacing robots () which can selectively clamp the side weirs () or the delivery nozzle or nozzles () and which can move between the roll unit (U) and the side-weir or delivery-nozzle preheating furnace (or) for installation/removal of the side weirs () or delivery nozzle or nozzles ().

Preheating member changer of dual roll casting apparatus

The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.

Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method

A processing solution preparation and supply apparatus includes a dissolving preparation bath to which a material powder and ultrapure water are supplied. This dissolving preparation bath is connected to a substrate processing apparatus via a pipe, and a processing solution prepared from the material powder on-site is supplied to the processing apparatus. To reduce an increase in the microorganism concentration in the ultrapure water, this ultrapure water is circulated substantially constantly. This suppresses deterioration and concentration fluctuations of a processing solution for use in processing of a semiconductor substrate, when this processing solution is supplied to the use side. This also reduces particles and improves the economical efficiency.

Processing solution preparation and supply method and apparatus

A developer liquid regenerating system is provided with a storage tank storing a TAAH (such as TMAH)- and photoresist-containing developer waste liquid, first separating means with NF membrane, connected to the waste liquid storage tank through conduits, a storage tank connected to the first separating means through a conduit, and second separating means with NF membrane, connected to the storage tank through conduits. The developer liquid regenerating system is also connected to a developing apparatus through a conduit connected to the storage tank, and to a developer liquid control/supply apparatus through a conduit connected to the storage tank.

Developer waste liquid regenerating apparatus and method

A treating liquid adjusting equipment for adjusting an alkali-based treating liquid for use in treating an organic film applied onto a substrate, which includes an adjusting portion. The adjusting portion for adjusting an alkalinity of the alkali-based treating liquid is such that a concentration of a first component contained in the alkali-based treating liquid and constituting an organic film of a same type as or different type from the organic film is in a range of 0.0001 to 2.0 mass %, and a concentration of an alkali component contained in the alkali-based treating liquid is in a range of 0.05 to 2.5 mass %.

Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment

The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment. This developer producing equipment comprises a preparation tank to which a developer stock solution and pure water are supplied, and in which these are agitated, first liquid amount measuring means for measuring the amount of the alkali type developer inside the preparation tank, first alkali concentration measuring means for measuring the alkali concentration of the abovementioned alkali type developer, first liquid amount control means for adjusting the amount of the alkali type developer inside the preparation tank on the basis of the measured value obtained by the abovementioned first liquid amount measuring means the abovementioned first alkali concentration measuring means, and liquid supply control means.

Developer producing equipment and method

The developer producing equipment of the present invention is equipped with a preparation tank to which a developer stock solution and pure water are supplied, and in which these ingredients are agitated, and a leveling tank which is connected to this preparation tank. The leveling tank is connected via piping to working equipment in which electronic circuits are formed. Furthermore, the preparation tank and leveling tank have first and second alkali concentration measuring means for measuring the alkali concentrations of the alkali type developer inside the respective tanks. In the preparation tank, either the amount of developer stock solution that is supplied to the tank or the amount of pure water that is supplied to the tank, or both, are adjusted on the basis of the measured value obtained by the first alkali concentration measuring means, so that an alkali type developer is prepared. This alkali type developer is fed into the leveling tank, where the alkali concentration is evened out, after which the alkali type developer is fed into the working equipment via piping.

Purified developer producing equipment and method

The apparatus for treating surface of boards includes treating means for treating surface of boards by supplying sequentially a treating solution and a rinse liquid on boards placed on a treating table; solution collecting means for collecting waste treating solution separately from waste rinse liquid; waste solution storing, concentrating detecting and solution supplementing means for storing the waste treating solution, detecting the concentration of at least one ingredient in the waste treating solution by an electric conductivity meter and/or an absorption photometer, supplementing treating solution for adjusting containing necessary ingredients depending on the detected value, and adjusting the treating solution; and treating solution feed means for feeding the adjusted treating solution into the treating means. By thus constructing, the treating solution can be recycled, and if recycling is repeated, the performance of the treating solution itself can be maintained.

Apparatus for treating surface of boards

In a semiconductor manufacturing process or a liquid crystal board manufacturing process, a resist stripping solution blending an organic alkali and an organic solvent is used for stripping the resist completely from the board. An apparatus for controlling this resist stripping solution comprises a resist stripping solution discharge device for discharging the resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution by using an absorption photometer, a source solution and water replenishing device for replenishing the resist stripping source solution and pure water by detecting the liquid level of the resist stripping solution by a liquid level gauge, and a source solution and/or water replenishing device for replenishing at least one of the resist stripping source solution pure water by detecting the water concentration of the resist stripping solution by using an another absorption photometer. As a result, in an apparatus for controlling a resist stripping solution used in resist stripping in a semiconductor manufacturing process or a liquid crystal board manufacturing process, the quality of the resist stripping solution is controlled constantly, the solution consumption is saved, the operation down time is reduced, and the cost is lowered.

Apparatus for controlling resist stripping solution

A casting roll (18) for a twin roll continuous caster comprises a roll body (19) made of a metal material having high rigidity and a sleeve (20) made of a metal material having high thermal conductivity for covering an outer periphery of the roll body (19). A plurality of load bearing members (23) with thicker width are provided peripherally on the outer periphery of the roll body (19), the load bearing members (23) being in contact with an inner periphery of the sleeve (20) and extending axially of the roll. A plurality of fins (24) with thinner width and shorter in height than the load bearing members (23) are provided on the inner periphery of the sleeve (20) between the adjacent load bearing members (23) and extending axially of the roll, cooling water passages (25) being provided in the form of gaps defined between the roll body (19) and the sleeve (20) thereby providing a roll having sufficiently high rigidity to prevent or at least minimise damage of the cooling water passages when the solidified shells are brought together between the rolls and/or having an enhanced heat transfer area.

Roll cooling structure for twin roll continuous caster

To suppress wear of side surfaces of end closures due to rotation of cooling rolls in a twin roll strip caster, a pair of housings 11 are provided, each arranged to face on end faces of one or the other ends of cooling rolls 1a and 1b, which are arranged substantially horizontally and in parallel with each other, so that it may be displaced toward and away from the end faces, rolling members 12 rotatably supported by each of said housings 11 so that they may contact the corresponding end faces of the rolls 1a and 1b, a thruster body 21 supported on each of the housings 11 so that it may be displaced toward and away from the corresponding end faces of the rolls 1a and 1b, and an end closure 3 loaded on each of the thruster bodies 21 so that it may closely contact upper portions of the end faces of the rolls 1a and 1b. When the end closure 3 is worn to a predetermined extent, then the rolling members 12 contact the end faces of the rolls 1a and 1b to thereby suppress wear of the end closure 3.

Twin roll continuous caster

A resist stripping solution is used in the stripping of resist in a liquid crystal board manufacturing process or semiconductor manufacturing process. The apparatus for controlling the resist stripping solution comprises a resist stripping solution discharge device for discharging resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution using an absorption photometer, first replenishing device for replenishing organic solvent and alkanolamine such as MEA or the like by detecting the liquid level of the resist stripping solution using a liquid level gauge, and second replenishing device for replenishing at least one of organic solvent and alkanolamine such as MEA or the like by detecting the concentration of alkanolamine such as MEA or the like of the resist stripping solution by an absorption photometer. As a result, the quality of the resist stripping solution can always be constant, and the consumption volume of the solution, the operation down time and the cost can be notably reduced.

An alkaline developing solution is used in development of photosensitive organic resin (photoresist) in liquid crystal board manufacturing process or printed board manufacturing process. The apparatus for controlling developing solution comprises developing solution discharge device for discharging developing solution by detecting the dissolved resin concentration in the developing solution by means of an absorption photometer (16), first replenishing device for replenishing undiluted developing solution and pure water by detecting the liquid level of the developing solution by means of a liquid level gauge (3), and second replenishing device for replenishing undiluted developing solution or pure water by detecting the alkali concentration of the developing solution by an electric conductivity meter (15). By thus constituting, the developing performance of the developing solution may be always kept constant, and the operation down time may be notably shortened.

Growing community of inventors

Tokyo, Japan

Shu Ogawa