Taiwan Semiconductor Manufacturing Comp. Ltd.

Shu-Hsien Wu

Kuan-Wen Lin

Sheng-Chi Chin

Chi-Lun Lu

Ting-Hao Hsu

Ching-Wei Shen

Tzu-Ting Chou

A method of cleaning a photomask is disclosed. The method includes mixing a first chemical solution with a second chemical solution; and discharging the mixed chemical solution through an outlet of a nozzle to a surface of the photomask on which includes a ruthenium (Ru) layer, wherein the first chemical solution is configured to dislodge contaminant particles from the surface of the photomask and the second chemical solution is configured to provide an electron to the first chemical solution.

Damage prevention on EUV mask

A pellicle mask assembly includes a mask, a pellicle frame, and a pellicle membrane. The pellicle frame has a bottom side attached to the mask, and a top side covered by the pellicle membrane. The pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the pellicle mask assembly. In embodiments, the change of environment includes increased humidity and/or increased chemical ion density inside the pellicle mask assembly. Methods of making and using the pellicle mask assembly are also disclosed.

Mask pellicle indicator for haze prevention

Growing community of inventors

Hsin-Chu County, Taiwan

Shu-Hsien Wu