Applied Materials, Inc.

Shreyas Patil Shanthaveeraswamy

Jallepally Ravi

Sandesh Yadamane

Manjunatha P Koppa

Zubin Huang

Harpreet Singh

Srinivas Tokur Mohana

Dien-Yeh Wu

Yu Lei

Yi Xu

Mehran Behdjat

Kim Ramkumar Vellore

Andrew J Constant

Michael P Karazim

Ribhu Gautam

Kumaresan Nagarajan

Geraldine M Vasquez

Vijay Singh

Process chamber shower head

Process chamber manifold

Shadow ring lift pin

Shadow ring lift assembly

Shadow ring lift plate

Embodiments of the present disclosure relate to a substrate transfer device having a contactless latch and contactless coupling providing the ability to lock and unlock the substrate transfer device at atmospheric and vacuum pressure with without particle generation at a base of the substrate transfer device, the contactless latch, and the contactless coupling. The substrate transfer device includes a lid having one or more lid grooves, a base having one or more base grooves, and a rotation member rotatably coupled to the lid. Each flange of one or more flanges of the substrate transfer device is rotatable in aligned lid grooves and base grooves, and each flange of the one or more flanges has an arm with a ferromagnetic material coupled thereto. The base is coupled to the lid when the ferromagnetic material of the arm is aligned and spaced from a magnetic material of a slot of the one or more base grooves.

Contactless latch and coupling for vacuum wafer transfer cassette

Growing community of inventors

Bengaluru, India

Shreyas Patil Shanthaveeraswamy