Beijing Boe Display Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Boe Technology Groupco., Ltd.

Shoukun Wang

Huibin Guo

Yuchun Feng

Liangliang Li

Zongjie Guo

Zheng Liu

Xiaowei Liu

Yongzhi Song

Hao Han

Fangbin Fu

Xi Chen

Jianfeng Yuan

Xiaoxiang Zhang

Tsungchieh Kuo

Mingxuan Liu

Tsung Chieh Kuo

Zhichao Zhang

Jing Wang

Jiantao Liu

Zhenyu Zhang

Yao Liu

Liang Sun

Linlin Wang

Zhichang Liu

Jingjing Jiang

Yihe Jia

Xiaming Zhu

Tsung-Chieh Kuo

An array substrate and a manufacturing method thereof, a display panel and a display device are disclosed. The array substrate includes a transparent base substrate and an electrode structure provided on the transparent base substrate, the electrode structure including an anti-reflective layer and a first electrode layer, the anti-reflective layer being located between the first electrode layer and the transparent base substrate.

Array substrate and manufacturing method thereof, display panel and display device

An array substrate, a manufacturing method thereof, and a display apparatus are provided. The array substrate includes a display area and a non-display area in the periphery of the display area, the display area includes pixel regions, the display and non-display areas are provided with via holes, wherein each pixel region is provided, at a side facing a display side, with a reflection layer configured to reflect light irradiated thereon from an external light source to form a display image; and an anti-deterioration layer in contact with the reflection layer is provided in the via holes in the display and non-display areas. Thus, by using a new material, utilization of external light source is improved without additional masking process, and connection in via holes in the display area, and especially in the non-display area is achieved, which prevents deterioration of the via holes and poor contact resistance.

Method for manufacturing array substrate, array substrate and display apparatus

A method for fabricating an array substrate motherboard, an array substrate motherboard and a detection method are provided. The method for fabricating an array substrate motherboard includes depositing a first film on a substrate, wherein a first gap is present between the edge of the first film and the edge of the substrate, coating photoresist on the substrate on which the first film is deposited, and exposing and developing the photoresist to form a first scale pattern from the photoresist. One end of the first scale pattern is flush with the edge of the substrate and the other end covers the first film.

Method for fabricating array substrate motherboard, array substrate motherboard and detection method

A mask, a manufacturing method thereof, and a patterning method employing the mask. In the mask, a plurality of masks can be combined into one mask. The pattern area () of the mask is provided with a first pattern section () and a second pattern section () which are not overlapped with each other; light of a first wavelength can run through the first pattern section () but light of a second wavelength cannot run through the first pattern section; the light of the second wavelength can run thorough the second pattern section () but the light of the first wavelength cannot run through the second pattern section; and the light of the first wavelength and the light of the second wavelength can run through the non-pattern area, or any of the light of the first wavelength and the light of the second wavelength cannot run through the non-pattern area. The mask is obtained by combining a plurality of masks.

Mask, manufacturing method thereof, patterning method employing mask, optical filter

The present invention provides an array substrate comprising a substrate, a metal conductive film layer, and an anti-reflective film layer located between the substrate and the metal conductive film layer, and a method for manufacturing the same, as well as a display device. The method comprises step S1: forming an anti-reflective film layer on a substrate by adjusting the reaction power and/or reactive gas flow during the formation of film by the chemical vapor deposition process; and step S2: forming a metal conductive film layer on the substrate finished in step S1. Through the preparation method of the array substrate, the anti-reflective film layer can have a sand-like granulation structure, such that light reflected from the metal conductive film layer can be blocked, thereby weakening or avoiding the light reflected from the surface of the metal conductive film layer, further improving the display effect of the array substrate.

Preparation method for array substrate

An array substrate, a display device, and a method for manufacturing the array substrate are disclosed. The array substrate includes a base substrate and a pixel array structure disposed on the base substrate, the pixel array structure includes at least one light shielding layer made of a light shielding material, and the light shielding material can prevent light leakage or light reflection, thereby increasing an opening ratio of the display device.

Array substrate, display device and manufacturing method for the array substrate

This present disclosure provides an array substrate, a manufacturing method thereof, and a display apparatus, aiming at solving the issue of light reflection on the array substrates and improving the display effects of display apparatuses. The array substrate includes a transparent substrate; a plurality of components disposed on a first side of the transparent substrate; and a shielding pattern, disposed on a second side of the transparent substrate, and configured to shield light reflected from a surface of at least one of the plurality of components.

Array substrate, manufacturing method thereof, and display apparatus

A method of manufacturing a thin-film transistor (TFT) array substrate, including: forming a gate layer, a gate insulating layer, an oxide semiconductor layer, a source/drain electrode layer and a pixel electrode layer on a base substrate. The step of forming the source/drain electrode layer and the pixel electrode layer includes: forming a transparent conductive film and a first metallic film on the oxide semiconductor layer in sequence, to form a stack layer of the transparent conductive film and the first metallic film, in which the transparent conductive film contacts the oxide semiconductor layer; and forming source electrodes, drain electrodes and pixel electrodes by a single patterning process on the stack layer of the transparent conductive film and the first metallic film. One patterning process is saved, the production time is shortened, and the production cost is reduced.

Manufacturing method of thin-film transistor (TFT) array substrate

The present disclosure provide an array substrate and a method of manufacturing the same, and a display panel. The array substrate includes: a base substrate; a first signal transmission layer comprising a common electrode line; a first insulating layer covering the first signal transmission layer and having a first through hole at a position corresponding to the common electrode line; a first electrode layer located on the first insulating layer, the first electrode layer comprising a connection electrode located at the position of the first through hole; a second insulating layer covering the first electrode layer and having a second through hole at a position corresponding to the connection electrode; and a second electrode layer comprising a common electrode that covers the second through hole; the connection electrode contacts the common electrode line and the common electrode respectively.

Array substrate and method of manufacturing the same, and display panel

A touch display panel, a manufacturing method thereof and a method of detecting a touch for the same are disclosed. The touch display panel includes a first substrate () and a second substrate (). The first substrate () includes, within its non-display region, a plurality of gate lines () parallel to each other, a plurality of data lines () parallel to each other, a plurality of first touch electrode lines () parallel to the gate lines (), and a plurality of second touch electrode lines () parallel to the data lines (). The first substrate () further includes first touch electrodes () electrically connected to the first touch electrode lines () and second touch electrodes () electrically connected to the second touch electrode lines (). Between two adjacent data lines (), there are two sub-pixels arranged in the same row on the first substrate (). A second touch electrode line () is located between the two sub-pixels. A pair of gate lines () are located between any two adjacent rows of sub-pixels on the first substrate (), and a first touch electrode lines () is located between the pair of the gate lines (). Since the first touch electrode line () and the second touch electrode line () are disposed within the light-proof non-display region, their impact on the aperture ratio can be avoided.

Touch display panel, manufacturing method and detecting method for the same

An array substrate and a method of manufacturing the same, a display panel and a display device are provided. The array substrate includes a thin film transistor and a pixel electrode. An insulating layer is formed between a drain electrode of the thin film transistor and the pixel electrode. The drain electrode is in direct electrical contact with the pixel electrode through a via-hole in the insulating layer.

Array substrate including pixel electrode and drain electrode in direct contact to each other, and method of manufacturing the same, display panel, and display device

A color film substrate comprises: a basal substrate, a plurality of color filters of at least one color formed on the basal substrate, and a black matrix formed on the basal substrate. The black matrix has a plurality of openings one-to-one corresponding to the plurality of color filters of at least one color. In a cross section perpendicular to the basal substrate, an edge of the color filter and an opening edge of the black matrix have an overlapping region. According to the color film substrate, manufacturing method thereof and display device provided by the embodiments of the present disclosure, by applying the technology of halftone mask plate and positive/negative photoresist, the patterns for the plurality of color filters of the at least one color and the pattern of the black matrix can be formed with one filter mask plate.

Color film substrate, manufacturing method thereof and display device

An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate, a signal line disposed on the base substrate, an extinction layer disposed between the base substrate and the signal line, the extinction layer being configured to reduce an ambient light when the array substrate is located on a light exiting side. An orthographic projection of the signal line in a plane of the base substrate is coincided with an orthographic projection of the extinction layer in the plane of the base substrate.

Array substrate, manufacturing method thereof, and display device

The embodiments of the present invention disclose a parallax bather and a fabricating method thereof. The parallax barrier comprises a first transparent conducting layer (), a second transparent conducting layer (), and an insulating layer () between the first transparent conducting layer () and the second transparent conducting layer (). The first transparent conductive layer () is formed into a plurality of signal electrode lines (), and the second transparent conductive layer () is formed into a plurality of common electrode lines (). The signal electrode lines () and the common electrode lines () are arranged alternately, and the common electrode lines () are located in a gap between adjacent signal electrode lines () with the insulating layer () in between.

Parallax barrier and fabricating method thereof, display panel and display device

An array substrate, a display panel, a display device, and a method for fabricating an array substrate are provided. The array substrate comprises gate lines and data lines on a substrate plate which are insulated from each other and intersect to define sub-pixel units, and the data lines comprise a first data line and a second data line which are arranged side by side between two neighboring columns of sub-pixel units. Between two of the sub-pixel units which are neighbors in a column direction, at least a portion of the first data line is arranged in a layer different from the neighboring second data line. At least a part of the first data line is arranged in a layer different from that of the neighboring second data line, to overcome the problem of short circuit between dual data lines.

Growing community of inventors

Beijing, China

Shoukun Wang