Nippon Telegraph and Telephone Corporation

Shouji Yagi

Katsuyuki Machida

Hiromu Ishii

Hakaru Kyuragi

Yasuyuki Tanabe

Tadao Nagatsuma

Masami Urano

Tomomi Sakata

Kunio Saito

In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.

Micromachine and manufacturing method

A surface shape recognition sensor of this invention has a surface protective film having a hydrophobic property on an insulating protective film which is made of an insulator and formed to cover a sensor electrode, and includes at least a ground electrode which is formed on the substrate such that the ground electrode is partly exposed on the surfaces of the insulating protective film and surface protective film so as to be insulated/isolated from the sensor electrode and come into contact with the surface of a detection target. This sensor prevents fingerprint residues from easily remaining and improves tamper resistance.

Surface shape recognition sensor and method of manufacturing the same

A micromachine manufacturing method according to this invention includes at least the movable portion formation step of selectively etching a single-crystal silicon layer by using a movable portion formation mask pattern as a mask, thereby forming on the single-crystal silicon layer a movable portion which is coupled to the surrounding single-crystal silicon layer via a coupling portion on a buried oxide, the movable portion protective film formation step of forming a movable portion protective film on the single-crystal silicon layer so as to cover the movable portion while the movable portion is formed on the buried oxide, and the step of forming a buried protective film which covers the movable portion exposed in the substrate opening and movable portion opening, and the single-crystal silicon layer around the movable portion while the movable portion protective film is formed.

Micromachine manufacturing method

In a pattern forming method, a trench is formed on a flat base. A pattern material is arranged only in and around the trench so as to project upward from the surface of the base and to be larger than the opening of the trench. The pattern material projecting from the surface of the base is removed by chemical mechanical polishing (CMP) so as to be flush with the upper surface of the base.

Growing community of inventors

Kanagawa, Japan

Shouji Yagi