Tokyo Electron Limited

Shoki Hamaguchi

Yuichiro Kunugimoto

Motoi Okada

Takafumi Hayama

Keishi Hamada

A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.

Substrate processing monitoring apparatus based on imaging video data, substrate processing apparatus, substrate processing monitoring method, and storage medium

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Hokkaido, Japan

Shoki Hamaguchi