Kabushiki Kaisha Toyota Chuo Kenkyusho

Toyota Jidosha Kabushiki Kaisha

Nikon Corporation

Aichi Steel Works, Ltd.

Shoji Noda

Osami Kamigaito

Haruo Doi

Kazuo Higuchi

Tomoyoshi Motohiro

Yasuhiko Takeda

Kiyoshi Uchida

Tatsumi Hioki

Masao Kohzaki

Akio Itoh

Yoshihide Watanabe

Yoshinobu Honkura

Shinji Kojima

Katsuyuki Ohsawa

Mikio Okamoto

Nobuyuki Yamamoto

Hiroshi Niikura

Shun-ichi Murasaki

Mikio Niimi

Mitsutaka Kakeno

Masao Kouzaki

Motohide Murayam

By providing a normally deposited layer as a buffer layer between a substrate and an obliquely deposited layer, it is possible to prevent contaminants on the substrate from diffusing into the obliquely deposited layer. Also, by providing a normally deposited layer as a passivation layer on the uppermost obliquely deposited layer, absorption of water vapor in the air by the obliquely deposited layer is prevented. Further, by forming a laminated object comprising obliquely deposited layers and dense normally deposited layers, strength of each obliquely deposited layer itself is increased and relaxation of its columnar structure can be suppressed with certainty because both the diffusion of contaminants from the substrate and the absorption of water in the air is prevented. Thus, by removing factors to accelerate the relaxation of columnar structure in the obliquely deposited layer, clouding of the obliquely deposited film layer can be prevented.

Obliquely deposited film element

A thin film layered member having high heat dissipation efficiency is composed of at least two diamond layers and at least one interlayer. The diamond layers and the interlayer ape alternately laminated and the diamond layers form outer surfaces of the thin film layered member. When this member is applied to a heatsink or the like, thermal stress to an element mounted thereon can be reduced because of a laminated structure comprising an interlayer having a high coefficient of thermal expansion and diamond layers having a low coefficient of thermal expansion. Further, the interlayer includes a carbide forming metal, which reacts with carbon atoms constituting a diamond in a laminating process and to form a carbide at an interface between the interlayer and the diamond layer, thereby realizing strong bonding therebetween.

Thin film layered member

An anisotropic nanophase composite material and a method of producing same. The composite material comprises a nanophase composite structure containing a multiplicity of particulates of at least one material. The particulates of one material are spaced from each other three-dimensionally and anisotropically oriented in a given direction. The particulates have an average thickness of 1 to 10 nanometers and an average length of not less than 10 nanometers, the length being larger than the thickness. Since the particulates of dimensions on the order of nanometers are oriented only in a given direction, the composite material produces an intensified nonlinear optical effect and is excellent in polarizing characteristics, birefringent characteristics, or photovoltaic characteristics.

Anisotropic nanophase composite material and method of producing same

When a mixture of gases containing carbon is burned to form a film of diamond on a surface of a substrate held at an appropriate temperature, it is so burned as to form a substantially flat region of incomplete combustion lying in parallel to the substrate surface and contacting it, while the region is surrounded by an air-shielding gas stream or formed under a reduced pressure.

Combustion flame method for forming diamond films

A sliding member which ensures a low coefficient of friction and a high degree of wear resistance, and is suitable for use in a bearing, mechanical seal, etc. It comprises a ceramic or metallic base, a diamond film formed on a surface of the base and having a rugged surface defining concavities, and a soft metal filling those concavities. When a relative sliding motion is made between it and a mating part formed from a hard material, only a low coefficient of friction occurs and the abrasive wear of the mating part is greatly reduced. It can maintain its high wear resistance for a long time even when it is used in a dry mode not involving the use of any lubricating oil, coolant, etc., since the diamond film does not undergo any change under heat to graphite having a lower degree of hardness.

Sliding member

A sliding electric part includes a set of two sliding members, wherein one of the sliding members is composed of a diamond substrate with an electric conductive portion formed by ion implanation or by the deposition of boron-doped p-type diamond on the sliding surface which slides along the other sliding member, and the other sliding member has an electric conductive portion formed on the sliding surface which slides along the one sliding member.

Sliding electric parts

A process for synthesizing diamond includes bringing a reactant gas is brought into contact with a porous heating element to form an activated gas, and bringing the activated gas into contact with a substrate to deposit diamond thereon. An apparatus for synthesizing diamond includes a heating means member including a porous heating element, a substrate, and a diamond depositing member. The reactant gas is heated and activated uniformly to a high temperature appropriate for synthesizing diamond by bringing the reactant gas into contact with the porous heating element, whereby a high quality polycrystalline diamond film can be deposited over a wider area on the surface of the substrate.

Process for synthesizing diamond and apparatus therefor

An unlubricated sliding member composed of a pair of sliding bodies. The sliding part of one sliding body is composed of a ceramic base portion and a thin film of, for example, Nb, which is integrally provided on the surface of the base portion. The sliding part of the other sliding body is composed of a diamond containing surface. The sliding member enables the coefficient of the friction caused when the pair of sliding bodies slide to be reduced, thereby keeping a long life of the sliding member. If the ceramic base portion is further subjected to ion implantation, the wear resistance of the sliding member is enhanced.

Unlubricated sliding member

Silicon and nitrogen ions are implanted in a ceramic body of silicon carbide and the ceramic body is heated in a nonoxidizing atmosphere, whereby it is reinforced.

Method of reinforcing a ceramic body of silicon carbide

A method for joining a ceramic material to a metallic material includes: forming a metallic film on the surface of the joining area of the ceramic material; irradiating the metallic film with high energy ions to allow the metallic film to stick firm to the surface of the ceramic material and to strengthen the surface of the ceramic material; and mechanically joining the ceramic material to the counterpart metallic material through the metallic film. The ceramic material subjected to these steps hardly breaks at the joining area where breaking otherwise occurs easily, thus enabling high-strength joining of ceramic and metallic materials.

Method for joining ceramic parts to metallic parts

A method of strengthening ceramic material by forming a metal film on the surface of the ceramic material and irradiating ions of high energy on the surface of the film. For further improvement, the material may be heat treated at a temperature of 600.degree. C. to 1600.degree. C. after the ion irradiation.

Method of strengthening ceramics

A method of producing a composite ceramic body which is comprises forming an amorphous ceramic film on the surface of a ceramic substrate; and irradiating said film with ions of high energy to cause atom mixing between said ceramic substrate and said amorphous ceramic film and to allow said film to adhere firmly and integrally to said substrate.

Method of producing a composite ceramic body

Fast union of a ceramic article to an opposed material is attained by a method which comprises forming a film of metal on the surface of the ceramic article, irradiating the surface of the metallic film with high-energy ions to bind the metallic film fast to the ceramic article, and supplying solder or brazing alloy to the surface of the metallic film and soldering or brazing the ceramic article to the opposed article. The high-energy ions for the irradiation has a magnitude of 30 to 800 keV and the dosage of the high-energy ions is in the range of 5.times.10.sup.15 to 2.times.10.sup.18 ions/cm.sup.2.

Growing community of inventors

Aichi, Japan

Shoji Noda