Ricoh Company, Ltd.

Shoji Matsumoto

Daisuke Kosaka

Hiroshi Yamazaki

Hidehito Kitakado

Masaaki Yoshida

Yukio Kadowaki

Hirotoshi Eguchi

Masahiro Shindo

Toshikazu Yoshimizu

Junichi Takahashi

Kouji Izumi

Toshio Kawakami

Shunpei Tamaki

Kenichi Kurihara

Kenji Fujita

Takashi Akahori

An IC mounting method and its resulting structure, such as an IC card is provided. An IC card includes a metal plate formed with at least one hole, and an IC chip is located fixed in position in the hole with a filler material filling the gap between the hole and the IC chip. An interconnect pattern is provided on the plate with an electrically insulating film sandwiched therebetween, and the interconnect pattern is in electrical contact with a contact pad of the IC chip. Preferably, the surface of the IC chip on which the contact pad is provided is substantially flush with one surface of the plate. When an electrically insulating film is fixedly attached to a substrate having a hole, in which an IC chip is fixedly provided, by an adhesive agent, the material of the film is selected to be similar to the material of the adhesive agent. In this manner, a contact hole may be formed in registry with a contact pad of the IC chip in the insulating film by one etching step without formation of a stepped portion in the resulting contact hole. Moreover, a film to be later removed is first formed on a substrate, and after providing elements on the film and its supporting structure, a predetermined processing, such as exposure to light, is applied to the film to change its property, thereby causing the elements to be separated away from the film.

IC chip mounting method

A thermal head comprising a substrate, a heat-resistant dielectric resin layer disposed on the substrate, a resistor layer disposed on the resin layer for forming a plurality of heating elements and an electrode layer disposed on the resistor layer for forming electrodes connecting to the heating elements. A protection film covers an end of the substrate and each end of the layers which is substantially in the same plane as the substrate end.

Thermal head

A semiconductor diffusion type force sensing apparatus includes a plate-like semiconductor substrate formed by a single crystal material, and a plurality of sensing elements each constituted by a substantially rectangular impurity-diffused region formed in the semiconductor substrate. The sensing elements have an electric resistance variable in accordance with a deformation thereof due to an external force exerted on the semiconductor substrate. The sensing elements are arranged in a direction in which a longitudinal direction of each of the sensing elements coincides with a crystal orientation of the semiconductor substrate having an external value of a longitudinal piezoresistance coefficient of the impurity-diffused region.

Semiconductor diffusion type force sensing apparatus

Growing community of inventors

Minoo, Japan

Shoji Matsumoto