Fuji Electric Co., Ltd.

Shoji Kitamura

Yoichi Shindo

Akira Amano

Masayuki Miyazaki

Shinji Ogino

Katsushi Nishiyama

Toshiyuki Matsui

Katsunori Suzuki

Akihiko Ohi

Kazuhiro Kitahara

Satoru Nagano

Tsukasa Tashima

Hiromi Mojikawa

Naokazu Sakamoto

Ken Komatsu

Takao Suyama

Katsumi Oguri

Takahiro Ooyama

Koji Nemoto

A semiconductor device, including a substrate of a first conductivity type, an active region and a termination structure portion formed on a front surface of the substrate, and a plurality of regions of a second conductivity type formed concentrically surrounding the periphery of the active region in the termination structure portion. Each region has a higher impurity concentration than one of the regions adjacent thereto on an outside thereof. The plurality regions include first and second semiconductor regions, and an intermediate region sandwiched between, and in contact with, the first and second semiconductor regions, and a third semiconductor region. The intermediate region includes a plurality of first subregions and a plurality of second subregions that are alternately arranged along a path in parallel to a boundary between the active region and the termination structure portion, the second subregions having a lower impurity concentration than the first subregions.

Semiconductor device

A semiconductor device, including a substrate of a first conductivity type, an active region and a termination structure portion formed on a front surface of the substrate, and a plurality of regions of a second conductivity type formed concentrically surrounding the periphery of the active region in the termination structure portion. Each region has a higher impurity concentration than one of the regions adjacent thereto on an outside thereof. The plurality regions include first and second semiconductor regions, and an intermediate region sandwiched between, and in contact with, the first and second semiconductor regions. The intermediate region includes a plurality of first subregions and a plurality of second subregions that are alternately arranged along a path in parallel to a boundary between the active region and the termination structure portion, the second subregions having a lower impurity concentration than the first subregions.

To enhance efficiency of a process of implanting impurities into a silicon carbide semiconductor layer. To provide a method of manufacturing a semiconductor device including a silicon carbide semiconductor layer, the method of manufacturing including: implanting impurities multiple times to an impurity implantation region in the silicon carbide semiconductor layer to different depths, with temperature of the silicon carbide semiconductor layer being set to be equal to or lower than 150&#xb0; C. In the implanting, impurities may be implanted multiple times to the impurity implantation region to different depths, with temperature of the silicon carbide semiconductor layer being set to be equal to or higher than room temperature.

Semiconductor device manufacturing method and semiconductor device

In an edge termination structure portion, first and second JTE regions are disposed concentrically surrounding an active region. Between the first and second JTE regions, a p-type electric field relaxation region is disposed that includes a first subregion and a second subregion alternately and repeatedly arranged concentrically surround a periphery of the first JTE region. An average impurity concentration of the electric field relaxation region is higher that the impurity concentration of the first JTE region adjacent on the inner side and lower than the impurity concentration of the second JTE region adjacent on the outer side. First subregions have widths that decrease the farther outward they are arranged. Second subregions have widths that are substantially the same independent of position. The first subregions and the first JTE region have equal impurity concentrations. The second subregions and the second JTE region have equal impurity concentrations.

A semiconductor device includes a first semiconductor layer of a first conductivity type provided on a front surface of a silicon carbide semiconductor substrate of the first conductivity type, a first semiconductor region of a second conductivity type, a second semiconductor region of the second conductivity type and connected to the first semiconductor region, a first electrode forming a Schottky-contact with the first semiconductor layer and the first semiconductor region, and a second electrode forming an ohmic contact with the second semiconductor region. The second electrode has a Ti&#x2014;Al alloy layer on a surface in contact with the first electrode. The second electrode further has therein a nickel silicide layer containing titanium.

Semiconductor device having an ohmic electrode including a nickel silicide layer

A silicon carbide semiconductor device includes a first semiconductor layer of a first conductivity type provided on a front surface of a silicon carbide semiconductor substrate of the first conductivity type; a first semiconductor region of a second conductivity type; a second semiconductor region of the second conductivity type, connected with the first semiconductor region; a first electrode forming a Schottky contact with a first semiconductor layer and a first semiconductor region; and a second electrode forming an ohmic contact with the second semiconductor region. A density of the second electrode is lower at a center portion of the silicon carbide semiconductor substrate and increases toward an outer peripheral side.

Silicon carbide semiconductor device

A simplified manufacturing process stably produces a semiconductor device with high electrical characteristics, wherein platinum acts as an acceptor. Plasma treatment damages the surface of an oxide film formed on a ntype drift layer deposited on an ntype semiconductor substrate. The oxide film is patterned to have tapered ends. Two proton irradiations are carried out on the ntype drift layer with the oxide film as a mask to form a point defect region in the vicinity of the surface of the ntype drift layer. Silica paste containing 1% by weight platinum is applied to an exposed region of the ntype drift layer surface not covered with the oxide film. Heat treatment inverts the vicinity of the surface of the ntype drift layer to p-type by platinum atoms which are acceptors. A p-type inversion enhancement region forms a p-type anode region.

Manufacturing method for semiconductor device with point defect region doped with transition metal

A semiconductor device and a manufacturing method thereof is disclosed in which the semiconductor device includes a p-type anode layer formed by a transition metal acceptor transition, and the manufacturing process is significantly simplified without the breakdown voltage characteristics deteriorating. An inversion advancement region inverted to a p-type by a transition metal acceptor transition, and in which the acceptor transition is advanced by point defect layers, is formed on the upper surface of an n-type drift layer. The inversion advancement region configures a p-type anode layer of a semiconductor device of the invention. The transition metal is, for example, platinum or gold. An n-type semiconductor substrate with a concentration higher than that of the n-type drift layer is adjacent to the lower surface of the n-type drift layer.

Semiconductor device and manufacturing method thereof

Semiconductor device with point defect region doped with transition metal

A fault position analysis method and a fault position analysis device for a semiconductor device, through which a fault position of a SiC semiconductor device can be analyzed and specified by an OBIRCH method, are disclosed. The fault position analysis method for the semiconductor device scans and irradiates a device and a circuit on a front surface of a substrate with a laser beam from a rear surface side of the substrate of the semiconductor device to heat the device and the circuit. It causes a current to flow to the device and the circuit while being heated, detects a change in a resistance value caused by a change in a current, and analyzes the fault position. The semiconductor device is a semiconductor device which uses an N-doped SiC substrate. Laser beams having wavelengths of 650 to 810 nm are used.

Fault position analysis method and fault position analysis device for semiconductor device

An N-type semiconductor layer with a low impurity concentration is grown by epitaxial growth on top of an N-type semiconductor substrate. An oxide film, with a desired pattern, is formed on the surface of the semiconductor layer. Using the oxide film as a mask, an active region edge and a guard ring region are formed by ion injection. After formation, the portion that forms the active region is exposed, and a paste containing platinum is coated onto the back surface of semiconductor substrate. The platinum is heat diffused into the substrate. Through this process, a region near the surface of the active region of semiconductor layer reverses to a P-type, and a shallow reverse region is formed, thereby producing a fast diode with adequate soft recovery characteristics.

Semiconductor device and manufacturing method for the same

A semiconductor laser device is provided which includes a laser diode chip mounted on a sub-mount, a monitor photo diode incorporated in the sub-mount, for monitoring a laser beam emitted by the laser diode chip, a metallic main plate mounting the laser diode chip and the monitor photo diode, an end-face breaking protective layer covering the laser diode chip and the sub-mount; and a seal resin in which the laser diode chip, the monitor photo diode, the end-face breaking preventive layer and at least a portion of the metallic main plate are sealed. In this semiconductor device, a space is provided at a portion of an interface between the end-face breaking preventive layer and the seal resin, which portion is adapted to be irradiated with a monitor laser beam emitted by the laser diode chip, with a light intensity that is not higher than a half of a peak value of the intensity of the monitor laser beam.

Semiconductor laser device and method for manufacturing the same

A semiconductor laser device is provided which includes: a metallic main plate to which a laser diode chip is fixed through a sub-mount incorporating a photo diode and which serves as an electric common for these diodes; three metallic posts that are electrically connected by wires to the main plate, laser diode chip and photo diode, respectively, and are spaced apart from the main plate; and a resin case in which the laser diode chip and sub-mount are sealed and to which fixing end portions of the main plate are fixed. The resin case secures the main plate and the three posts in position such a way as to avoid direct contact therebetween.

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Matsumoto, Japan

Shoji Kitamura