Kokusai Electric Co., Ltd.

Sony Group Corporation

Shoichiro Izumi

Masaru Kuramoto

Ryoji Saito

Toshikazu Karino

Yasuhiro Harada

Koji Tometsuka

Tohru Yoshida

Makoto Ozawa

Fumihide Ikeda

Satoshi Kakizaki

Noriyuki Futagawa

Mikio Koizumi

In the semiconductor manufacturing apparatus according to the present invention, there are provided a cassette stocker for accommodating wafer cassettes loaded with wafers, a reaction furnace provided with heating means, a reaction gas introducing means for introducing reaction gas into the reaction furnace, a gas discharging means for discharging exhaust gas in the reaction furnace, a boat for supporting wafers, a buffer cassette stocker for storing unprocessed wafers, a boat elevating means for inserting the boat into and retrieving the boat from the reaction furnace, a wafer transfer means for transferring wafers between the boat and the wafer cassette accommodated on the cassette stocker, and a wafer cassette transfer means for transferring wafer cassettes between the buffer cassette stocker and the cassette stocker, and the buffer cassette stocker is enclosed to provide an antioxidation area to prevent natural oxidation of the wafers in standby status.

Semiconductor wafer reaction furnace with wafer transfer means

A wafer transfer method and mechanism in a vertical CVD diffusion apparatus and a control device for the method and mechanism. The vertical-type CVD diffusion apparatus has a boat containing many wafers in a horizontal orientation, stacked vertically. Product wafers are transferred to the boat five by five, dummy wafers are transferred five by five or a fraction less than five, and monitor wafers are inserted one by one between a block of the product wafers and another block of the product wafers, or a block of the dummy wafers.

Wafer transfer mechanism in vertical CVD diffusion apparatus

A wafer transfer method and mechanism in a vertical CVD diffusion apparatus and a control device for the method and mechanism. The vertical-type CVD diffusing apparatus has a boat containing many wafers in a horizontal orientation, stacked vertically. Product wafers are transferred to the boat five by five, dummy wafers are transferred five by five or a fraction less than five, and monitor wafers are inserted one by one between a block of the product wafers and another block of the product wafers, or a block of the dummy wafers.

Wafer transfer method in vertical CVD diffusion apparatus

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Tokyo, Japan

Shoichiro Izumi