Alps Electric Co., Ltd.

Other

Frontec Incorporated

Shoichi Ono

Yasuhiko Kasama

Akira Nakano

Koichi Fukuda

Tadahiro Ohmi

Sung Chul Kim

Kenichi Mitsumori

Go Kato

Nobuaki Haga

Junichiro Soejima

Norihisa Takahashi

Kei Sameshima

Akio Fujie

Mineo Iwasaki

Yasuhiro Takeda

Atsuhito Kobayashi

A method for manufacturing a rotor core includes detecting a height of a projecting portion formed on a lower die by a height detecting unit, and placing onto the lower die a core body in which a magnet insertion hole is formed such that the projecting portion is positioned in the magnet insertion hole when the height detecting unit has determined that the height of the projecting portion is within a set range. Additionally, the method includes bringing a permanent magnet in the magnet insertion hole into contact with an upper end of the projecting portion, and placing onto the core body a holding member after bringing the permanent magnet into contact with the upper end of the projecting portion. Melted resin is injected into the magnet insertion hole in which the permanent magnet has been inserted after placing the holding member onto the core body.

Method for manufacturing rotor core

A second housing whose center portion is depressed and whose end portion around the center portion is formed like a visor is arranged around a first housing whose center portion is depressed and whose end portion around the center portion is formed like a visor, and a hollow portion is formed between the first housing and the second housing by sandwiching a packing between the end portions of the housings. Further, degassed water for preventing empty heating is filled in the hollow portion, and an ultrasonic transducer is placed on the surface of the center portion of the first housing. A weight for preventing the vibration of the wall is provided on the wall surface of the second housing. Since the vibration of the wall of the housing is suppressed by the weight, vibration energy returns toward the bottom surface of the center of the housing through water and is radiated from the bottom surface efficiently as ultrasonic waves.

Ultrasonic cleaner and wet treatment nozzle comprising the same

The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster as compared with conventional plasma equipment, and the film quality is high. Metal plates AC short between a chamber wall and a shield of an electrode of the same DC potential as the chamber.

Impedance measurement tool

Plasma treatment equipment

A plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.

Plasma processing apparatus

In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one of the two electrodes which form a tuning capacitor also serves as the plasma excitation electrode. Alternatively, in a plasma processing apparatus, the side wall of a housing made from an electrically conductive member and accommodating a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode and a feeder for supplying high-frequency electric power from the high-frequency power source to the plasma excitation electrode through the matching circuit is formed not in parallel to the feeder.

Plasma processing apparatus, matching box, and feeder

An alignment system for photoelectric switch includes a variable frequency oscillator producing a frequency which varies according to a light reception signal from a light receiving element in the photoelectric switch. A light emitting device is energized by the output of the variable frequency oscillator to give a visual indication of alignment. A threshold compares the amplitude of the light reception signal with a preset voltage. When the light reception signal exceeds the preset voltage, a logic element provide steady illumination of the light emitting device as an indication that alignment is completed. A lower threshold is then applied to the threshold to keep the light emitting device steadily illuminated until misalignment or propagation conditions reduce the amount of light received.

Method and apparatus for visual indication of optical alignment of

Growing community of inventors

Miyagi-ken, Japan

Shoichi Ono