Advanced Micro Devices Corporation

Fujitsu Corporation

Other

Shoichi Kawamura

Binh Quang Le

Shane Charles Hollmer

Pau-Ling Chen

Sameer S Haddad

Yu Nan Sun

Chi K Chang

Michael S Chung

Chung-You Hu

Masaru Yano

Vincent C Leung

Mike Van Buskirk

Michael Van Buskirk

Paul-Ling Chen

A series select transistor and a source select transistor are connected in series at the end of a NAND string of floating gate data storage transistors. The floating gates, the series select gate, and the source select gate are all preferably formed of polysilicon. The same tunnel oxide layer is used as gate oxide for the series select transistor and source select transistor as well as for the floating gate data storage transistors. Two layers of polysilicon in the series select gate and the source select gates are tied together. The series select transistor is tied to the last transistor in the NAND string. The source select transistor is tied to the array Vss supply. In order to program inhibit a specific NAND cell during the programming of another NAND cell, the gate of the series select transistor is raised to Vcc, while the gate of the source select transistor is held to ground. The two transistors in series are able to withstand a much higher voltage at the end of the NAND string without causing gated-diode junction or oxide breakdown in either the series or the source select transistor.

Dual source side polysilicon select gate structure and programming method utilizing single tunnel oxide for nand array flash memory

Dual source side polysilicon select gate structure and programming

In the programming of a non-volatile memory device, such as a NAND flash memory device 100, a positive bias voltage V.sub.bias is applied to a bit line 44 to set a respective memory gate 44a in a programmed state. In a further embodiment, the positive bias voltage V.sub.bias is obtained by dividing the select drain gate voltage V.sub.cc using two resistors 56 and 58 connected in series.

Bit line biasing method to eliminate program disturbance in a

Dual source side polysilicon select gate structure utilizing single

Two NMOS boost transistors have their sources connected to the high voltage input while their drains and gates are cross-connected. Two coupling capacitors connect two alternate phase clocks to the gates of the two cross-connected boost transistors. An NMOS pass transistor has its gate connected to the drain of one of the NMOS boost transistors, its source connected to the high voltage input, and its drain connected to the output. In an embodiment, two diode-connected regulation transistors connect the gates of the boost transistors to the high voltage input. These connections insure that the gates of the boost transistors and the gate of the pass transistor never reach voltages higher than one threshold voltage above the high voltage input. In another embodiment, two discharge transistors have their drains connected to a decode input, their sources connected to the gates of the boost transistors, and their gates connected to the positive power supply. By setting the decode input at zero volts, the voltages at the gates of the boost transistors and of the pass transistor are held at zero volts, thus disabling them. In the preferred embodiment, both the regulation transistors and the discharge transistors are included in the high voltage pass gate.

High voltage NMOS pass gate for integrated circuit with high voltage

A high-voltage level shifter includes one or more complementary NMOS/PMOS series intermediate transistor pairs to divide the high-voltage supply range into two or more sub-ranges. The level shifter has a differential structure with complementary NMOS input transistors. Cross-coupled PMOS output transistors provide complementary outputs. The complementary NMOS/PMOS series intermediate transistor pairs separate the NMOS input transistor drains from the PMOS output transistor drains. In order to divide the high voltage range into h subranges, h-1 complementary NMOS/PMOS series intermediate transistor pairs are used each being biased by monotonically increasing fixed intermediate voltages. In a shared-bias embodiment, each complementary NMOS/PMOS series intermediate transistor pair is biased by a single corresponding intermediate voltage. In a split-bias embodiment, each complementary NMOS/PMOS series intermediate transistor pair is biased by a corresponding NMOS bias voltage and a corresponding PMOS bias voltage, in which the NMOS bias voltage is higher than the PMOS bias voltage by the sum or the NMOS threshold voltage and the PMOS threshold voltage. In another aspect, the N-wells of the PMOS transistors are tied to an upwardly vertically adjacent intermediate voltage in the shared-bias embodiments, and are tied to an upwardly vertically adjacent NMOS bias voltage in the split-bias embodiments. In a twin tub embodiment for very high voltage applications, the P-wells of the NMOS transistors are tied to a downwardly vertically adjacent intermediate voltage in the shared-bias embodiments, and are tied to a downwardly vertically adjacent PMOS bias voltage for the split-bias embodiments.

High-voltage CMOS level shifter

Growing community of inventors

Sunnyvale, CA, United States of America

Shoichi Kawamura