Panasonic Corporation

Shoichi Imashiku

Kazuyoshi Honda

Hideharu Takezawa

Sadayuki Okazaki

Masanori Sumihara

Kaoru Nagata

Takashi Otsuka

Tomofumi Yanagi

Seiichi Kato

Takashi Nonoshita

Takeshi Kasamatsu

Hitoshi Katayama

An electrodehas an active material layerformed on each of two whole main surfaces of a current collector. A part of an electrode leadoverlaps the electrode. One end face of the electrodein the width direction of the electrodeis flush with one end face of the electrode lead. Jointsare formed at the one end of the electrodein the width direction. The jointsjoin the electrodeand the electrode leadso as to provide electrical continuity between the exposed part of the current collectorat the one end face of the electrodein the width direction and the electrode lead. The jointsare formed, for example, by plasma welding.

Electrode structure for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery

An electrode for an electrochemical element reversibly absorbing and releasing lithium ions including: a current collector having a higher first convex portion and a lower second convex portion on at least one surface thereof; a columnar body including an active material formed in such a manner as to rise obliquely on the first convex portion and the second convex portion of the current collector.

Electrode for electrochemical element and electrochemical element using the electrode

A vapor deposition devicefor moving a sheet-like substratein a roll-to-roll system in a chamberto continuously form a vapor deposition film on the substrate. The vapor deposition devicecomprises an evaporation sourcefor evaporating a vapor-depositing material; a transportation section including first and second rollsandfor holding the substratein the state of being wound therearound and a guide section for guiding the substrate; and a shielding section, located in a vapor deposition possible zone, for forming a shielded zone which is not reachable by the vapor-depositing material from the evaporation source. Vapor deposition zonesthroughinclude a planar transportation zone for transporting the substratesuch that the surface of the substrateto be subjected to the vapor-depositing material is planar; and the transportation section is located with respect to the evaporation sourcesuch that the vapor-depositing material is not incident on the substratein a direction of the normal to the substrate in the vapor deposition possible zone excluding the shielded zone.

Deposition apparatus and method for manufacturing film by using deposition apparatus

Growing community of inventors

Osaka, Japan

Shoichi Imashiku