Nikon Corporation

Honda Motor Co., Ltd.

Mitsubishi Electric Corporation

Tokyo Shibaura Denki Kabushiki Kaisha

Nikon Metrology Nv

Shohei Suzuki

Mamoru Nakasuji

Hajime Yamamoto

Hiroshi Maeda

Atsushi Yamada

Shimpei Shikanai

Yasuko Nakajima

Yukari Inai

Takeshi Endo

Teruaki Okino

Tatsuya Ryuzaki

Koji Suzuki

Yoshiyuki Kuroba

Naoto Yamashita

Shintaro Kawata

Atsushi Ito

Katsuhisa Yamada

Yasuo Fujii

Makoto Hattori

Futoshi Koga

Tatsuki Matsunaga

Takayuki Haramoto

Masakuni Ando

Sumito Shimizu

Akihito Kawamura

Yoshihide Yuza

Takahiro Kurahori

Keitaro Hara

Yasuaki Tezuka

Shinya Takahashi

Akira Bannai

Norikazu Hattori

Wakako Suganuma

Andriy Denysov

Stephen Fletcher

Takashi Watanabe

Mitsunobu Ito

Shuji Obayashi

Hisao Kinoshita

Takahito Nishiyama

The inverter includes: a main body case accommodating main circuit terminal block and a control terminal block, high-voltage wire and low-voltage wire being respectively connected to the main circuit terminal block and the control terminal block; a wire cover detachably attached to the main body case to cover the main circuit terminal block; and a front cover detachably attached to the wire cover to cover the control terminal block, the front cover being fixed to the main body case with a fastening member requiring a tool for removal. The front cover includes a stopper, and, in a state where the front cover is attached to the wire cover, the stopper is located on a path through which the wire cover moves when removing the wire cover from the main body case.

Power conversion apparatus

A straddle type vehicle comprises: a detection unit for detecting a condition of front of a vehicle; a cleaning member capable of cleaning the detection unit; and a movable apparatus for changing a position of the cleaning member in relation to the detection unit in a height direction of the vehicle, wherein the cleaning member, by the changing of the position, performs the cleaning by wiping with a portion of the detection unit where the cleaning unit contacts the detection unit.

Straddle type vehicle

An information provision system that allows appropriate information provision suited for a user who is a driver. The information provision system includes: an emotion information database that records emotion information detected by an emotion detection part that detects emotion of a user and outside information being associated with the emotion information; and a browsing information generation part that generates browsing information when a predetermined emotion kind is detected by the emotion detection means.

Information provision system

An information provision system that allows appropriate information provision suited for a user who is a driver. The information provision system includes a route proposition part that proposes a route based on emotion information detected by an emotion detection part, which detects emotion of a user and spot information associated with the emotion information. The route proposition part sets targeted emotion kinds from a departure spot to a final guiding spot and proposes a route including spots corresponding to the emotion kinds that are set based on the emotion information and the spot information.

Information provision system for route proposition based on emotion information

An album generation apparatus comprises a first acquisition unit configured to acquire identification information for identifying a combination of a user and a mobile object, a second acquisition unit configured to acquire one or more images from one or more image capturing apparatuses, a selection unit configured to select, from the one or more images, an image including the combination of the user and the mobile object by using the identification information, and a generation unit configured to generate an album by using the selected image.

Album generation apparatus, album generation system, and album generation method

A charged particle device includes an electron emitting part for emitting electrons, an electron irradiated part configured to be irradiated with the electrons emitted from the electron emitting part, a container part configured to evacuate an interior thereof and contain the electron irradiated part in the interior thereof, an electric wire containing part configured to be inserted from an outside of the container part via an insertion part provided in the container part to contain an electric wire through which electricity is conducted to the electron irradiated part contained in the container part, and an insertion-part-side protrusion part configured to surround the electric wire containing part and protrude from a vicinity of the insertion part on an inner wall of the container part to an interior of the container part.

Charged particle device, structure manufacturing method, and structure manufacturing system

An information providing system of a motorcycle includes a navigation device and an audio device. The navigation device includes a navigation controller. The navigation controller is disposed in a trunk on a side surface of the trunk close to a back surface of a passenger seat. The trunk is provided in a rear portion of a vehicle body of the motorcycle and above a rear wheel of the motorcycle. The audio device includes an audio device operation part and an audio device controller. The audio device operation part is provided in a vicinity of a handlebar of the motorcycle. The audio device controller is disposed in an audio device housing provided at a position lower than a bottom plate of the trunk.

Information providing system of motorcycle

Apparatus and methods are disclosed for inscribing a pattern on a reticle blank to produce a lithography reticle. As a reticle blank is inscribed using a charged particle beam (e.g., electron beam), some of the incident charged particles pass through the reticle blank and are backscattered from underlying structure (e.g., from a stage used to hold the reticle blank during inscription). These backscattered particles reduce the pattern resolution on the reticle. The present apparatus and methods reduce the number of backscattered particles re-entering the reticle blank, thereby improving pattern resolution.

Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons

Charged-particle-beam (CPB) microlithography methods and apparatus are disclosed with which large single-shot image-transfer regions (subfields) can be exposed using maximal beam current. Beam current is changed over a selected range to determine a suitable range of beam-spread angles that include the maximum permissible values for average blur, &Dgr;blur, and distortion. Assuming that that range of beam-spread half-angles is between &agr; and &agr; , then the beam current for which &agr; is designated as a cutoff beam current. The beam-spread half-angle at that beam current is the optimal beam-spread half-angle. The ratio between the distribution half-angle and the cutoff half-angle is varied, and a determination is made of the distribution half-angle and cutoff half-angle that will accommodate the greatest beam current. Thus, a maximum beam current can be used while maintaining blur and distortion of the projected subfield image within specified values set for them.

Methods and apparatus for controlling beam blur in charged-particle-beam microlithography

Apparatus and methods are disclosed for charged-particle-beam (CPB) microlithography using a hollow beam. The hollow beam is produced by passing the charged particle beam through a scattering aperture. However, passage of the beam is performed in a manner by which the scattering aperture is prevented from overheating. Also, the scattering aperture can be made from a material that is micro-machined easily. The scattering aperture can be configured as a beam-scattering aperture plate defining voids that collectively define an annular aperture. The scattering aperture is situated at a beam-crossover plane. As the charged particle beam strikes the scattering aperture, particles pass readily through the voids as a &ldquo;transmitted beam.&rdquo; Particles incident on the scattering aperture plate are scattered and become a &ldquo;scattered beam.&rdquo; The transmitted beam passes readily through a downstream blocking aperture, whereas most particles of the scattered beam are absorbed by the blocking aperture.

Charged-particle-beam microlithography apparatus and methods for preventing coulomb effects using the hollow-beam technique

The present invention provides CPB projection apparatus and transfer methods for transferring a pattern from a mask onto a wafer with precise linear-distortion correction of transferred images without creating significant astigmatic blur of the image. A preferred embodiment of the projection apparatus includes an illumination-optical system and a projection-optical system. The illumination-optical system includes a CPB source for emitting a charged-particle beam, and first and second condenser lenses. A field-limiting aperture limits the field of the charged-particle flux. A first astigmatic-aberration correction coil is positioned at a principal plane of either the first or second projection lens and corrects linear distortion of a resulting projected image. A third condenser lens collimates the beam to form an image of the field-limiting aperture on a selected subfield of the mask. A projection-lens system demagnifies the image formed by the mask and projects the demagnified image on a wafer. A crossover aperture is positioned between the projection-lens system to further shape the CPB flux. A second astigmatic-aberration-correction coil is positioned parallel with the crossover aperture to correct astigmatic blur.

Charged-particle-beam projection apparatus and transfer methods

A charged-particle-beam pattern-transfer apparatus is provided wherein a CPB is emitted from the CPB source, is focused by first and second condenser lenses, and is illuminated onto a mask. A deflector deflects the CPB to a selected subfield of the mask. The CPB transmitted by subfield is projected by a first projection lens toward a back-focal-plane aperture. The portion of the CPB that passes through the back-focal-plane aperture is projected by a second projection lens onto a wafer. Coulomb effect induced shifts in focal-point position, and changes in image magnification, projected-image rotation, and astigmatic blur and astigmatic distortions of the image are each corrected by application of electric current supplied to each component of a correction system, the correction system preferably comprising a set of correction lenses and two stigmators.

Charged-particle-beam-projection-microlithography transfer methods with

A charged-particle-beam pattern-transfer apparatus is provided wherein a CPB is emitted from the CPB source, is focused by first and second condenser lenses, and is illuminated onto a mask. A deflector deflects the CPB to a selected subfield of the mask. The CPB transmitted by subfield is projected by a first projection lens toward a back-focal-plane aperture. The portion of the CPB that passes through the back-focal-plane aperture is projected by a second projection lens onto a wafer. Coulomb-effect-induced shifts in focal-point position, and changes in image magnification, projected-image rotation, and astigmatic blur and astigmatic distortions of the image are each corrected by application of electric current to respective components of a correction system, the correction system preferably comprising a set of correction lenses and two stigmators.

Charged-particle-beam projection-microlithography apparatus and transfer

Methods are disclosed for improving the accuracy of pattern registration between various layers formed on a sensitive substrate by microlithography using a charged-particle beam, especially registration accuracy as affected by rotation of image portions relative to corresponding image portions in an earlier applied layer. Errors in rotational angle of a pattern transferred to the n.sup.th layer and the arrangement direction of the transferred pattern on the substrate are measured. During projection of the (n+m).sup.th (e.g., the (n+1).sup.th) layer, the rotational angle of images that have passed through the mask subfields is corrected according to the measured rotational angle. Also, the deflection direction of the images on the substrate that have passed through the mask subfields is corrected according to the measured arrangement direction. The transfer subfields in the (n+m).sup.th layer can be accurately stitched together and corresponding transferred pattern in the n.sup.th and (n+m).sup.th layer can be accurately registered with respect to each other.

Charged-particle-beam projection methods

Charged-particle-beam transfer-exposure apparatus are disclosed exhibiting reduced hybrid distortion. A charged particle beam passes through a mask and through a projection-lens assembly to form an image of a selected mask region on a wafer. Signals corresponding to the functions d.sub.x1 (X.sub.w, Y.sub.w, Z, I, s), d.sub.y1 (X.sub.w, Y.sub.w, Z, I, s), d.sub.x2 (X.sub.w, Y.sub.w, Z, I, s), d.sub.y2 (X.sub.w, Y.sub.w, Z, I, s), . . . , are generated by a computer and routed to respective deflectors to minimize deflection aberrations, wherein X.sub.w, Y.sub.w are the coordinates of the deflected transfer region on the wafer, Z is the wafer height, I is the beam current passing through the pattern area in a mask region, and s is a variable pertaining to scattering of charged particles in the pattern. The signals routed to the various deflectors also take into account the function g(X.sub.w, Y.sub.w, Z, I, s) which corrects deflection distortion.

Charged-particle-beam projection-exposure method exhibiting aberration

Growing community of inventors

Tokyo, Japan

Shohei Suzuki