Asahi Kasei Kogyo Kabushiki Kaisha

Shin-etsu Chemical Co., Ltd.

Asahi Kasei Kabushiki Kaisha

Shohei Nakamura

Kousi Anai

Hironao Fujiki

Takafumi Sakamoto

Tarou Kita

Yoshimasa Tuji

Yasuhiko Matsuoka

Nobuyasu Kinoshita

Shuji Kozaki

Kuniaki Minonishi

Kenichi Morotomi

Yoshiyuki Suenaga

Replicas are molded by curing a photo-curable liquid silicone rubber composition to form a transparent mother mold having a cavity corresponding to the outer contour of a master model, casting a photo-curable liquid resin into the mold cavity, and irradiating light to the liquid resin through the mold wall. Replicas can be fabricated by simple steps and within a short time.

Replica molding

A photosensitive resin composition for cast molding, which has an ultraviolet transmittance of 0.05-5% as measured at a 1-mm thickness.

Photosensitive resin composition for photo-cast-molding

A photoresin printing plate having a Shore A hardness at 20.degree. C. of 25 to 60, an impact resilience at 20.degree. C. of 35% or more as measured by a falling ball method and a surface tack at 20.degree. C. of 40 g/cm or less has been found not only to be capable of providing prints having an image of high precision but also to be capable of releasing the paper dust or the like, which has adhered to the printing plate, in a short period of time during the printing operation, so that it did not become necessary to interrupt the printing operation in order to clean the printing plate, which leads to an efficient production of the prints.

Photoresin printing plate for use in printing a corrugated board

Photosensitive elastomer composition

A method for producing a photocured image structure, comprising providing a selectively photocured elastomer composition layer having a photocured image portion and an uncured portion, and contacting the selectively photocured elastomer composition layer with a developer comprising a specific ester and optionally a specific alcohol in a specific volume ratio, to wash-out the uncured portion and develop the photocured image portion, thereby obtaining the photocured image structure. By this method, not only is the swelling of the image structure minimized but also the danger of relief breakage and orange peel formation is eliminated, so that an excellent photocured image structure can be produced by a simple operation.

Method for producing a photocured image structure

A mask element for selective sandblasting comprising a support film layer and, superimposed thereon in the following order, a retainer film layer of a water-insoluble cellulose derivative and a photoresist layer of a pattern mask, said photoresist layer of pattern mask being adapted to adhere to the surface of an article body to be engraved with a strength such that the mask is not detached therefrom during sandblasting. By the use of the mask element of the present invention, a pattern exactly corresponding to that of the mask, even if it is very fine, can be engraved on an article body nicely.

Mask element for selective sandblasting and a method

The actinic radiation-exposed or unexposed areas, whichever are relatively low in abrasion resistance, formed in a photosensitive composition layer superimposed on a substrate are selectively removed by blowing an abrasive material against the layer, thereby to obtain a desired image in the layer. By utilizing an article body intended for engraving a pattern as the substrate and by further blowing an abrasive material against the article body until the article body comes to have a pattern of desired depth, a pattern-engraved article can be advantageously produced. The above processes are extremely advantageous over the prior art because any solvent is not needed for the development so that the treatment of the waste solvent and the drying step can be eliminated and because a pattern-engraved article can be produced by the dry process in which the number of necessary steps is reduced.

Dry process for forming an image

A process for preparing a mask for sandblasting, in which there is employed a transparent soluble peel-aid film layer superimposed on a transparent protective film layer to cover a liquid photopolymerizable composition layer. According to the process, the protective film can be readily stripped and a mask for sandblasting which has a strong adherence to articles to be engraved can be produced efficiently without occurrence of troubles, such as chipping of high-precision portions, e.g. fine dots and lines, of polymeric images.

Process for preparing a mask for sandblasting

A novel photosensitive elastomeric composition comprising a thermoplastic elastomer, an ethylenically unsaturated compound, a photopolymerization initiator and an N-substituted maleimide compound. The composition of the present invention is excellent in photosensitivity. The composition of the present invention is useful especially for the manufacture of flexographic printing elements.

Photosensitive elastomeric composition

A novel photosensitive elastomeric composition comprising a thermoplastic elastomeric block copolymer, an ethylenically unsaturated compound derived from fumaric acid or maleic acid and a photopolymerization initiator. The composition of the present invention is excellent in various properties, especially in heat stability. The composition of the present invention is useful, especially for the manufacture of flexographic printing elements.

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Fuji, Japan

Shohei Nakamura