Sony Corporation

Shodai Nakayama

Hitoshi Abe

Osamu Akimoto

Toshihiko Orii

Toshihiko Mochida

Disclosed is a semiconductor device capable of realizing a reduction in the area of each pixel without degrading noise resistance. A switching transistor () and a signal accumulation capacitor () are formed on a semiconductor substrate (base semiconductor region) () of a first conduction type, on the basis of each unit region for constituting a pixel Px. The switching transistor () has a structure in which a source region (S) and a drain region (D) of a second conduction type are formed on the semiconductor substrate (), and a gate electrode (G) is formed on the region between the source region (S) and the drain region (D), with an insulating layer () therebetween. The signal accumulation capacitor () has a structure in which high-concentration semiconductor regions (D) and (S) of the first conduction type are formed on the semiconductor substrate (), and an electrode (G) is formed on the region between the semiconductor regions (D) and (S), with an insulating layer () therebetween. A structure may be adopted in which a bias semiconductor region () is not provided, and the semiconductor regions (D) and (S) are made to serve also as the bias semiconductor region.

Growing community of inventors

Nagasaki, Japan

Shodai Nakayama