National Institute of Advanced Industrial Science and Technology

Tokyo Ohka Kogyo Co., Ltd.

Sho Kataoka

Kiwamu Sue

Masatoshi Arai

Kazuhiko Sato

Yoshitaka Komuro

Hiroshi Kumai

Minoru Hasegawa

Takaya Maehashi

Daisuke Kawana

Norihisa Fukaya

Jun-Chul Choi

Toshio Horikoshi

Seong-Jib Choi

Takatoshi Inari

Thuy Nguyen

Yusuke Yoshigoe

An organically modified metal oxide nanoparticles that can be produced by a simple method and can increase the sensitivity and resolution of a resist material. The EUV photoresist material contains organically modified metal oxide nanoparticles and a solvent. The organically modified metal oxide nanoparticles include a core, a first modification group, and a second modification group. The core includes a plurality of metal atoms and a plurality of oxygen atoms bonded to the plurality of metal atoms. The first modification group is a carboxylic acid carboxylate ligand coordinated to the core. The second modification group is a carboxylic acid carboxylate ligand coordinated to the core and having a smaller molecular weight than the first modification group and/or an inorganic anion smaller in size than the first modification group.

Organically modified metal oxide nanoparticle, method for producing the same, EUV photoresist material, and method for producing etching mask

Organically modified metal oxide nanoparticles containing two or more cores including a plurality of metal atoms and a plurality of oxygen atoms covalently bonded to the plurality of metal atoms; a first modifying group that is a ligand coordinated to each of the cores and selected from the group consisting of a carboxylic acid carboxylate, a sulfonic acid sulfonate, and a phosphonic acid phosphonate; and a second modifying group that is coordinated to each of the cores and is a ligand having a structure different from that of the first modifying group and/or an inorganic anion, in which organically modified metal oxide nanoparticles have a structure in which the cores are crosslinked through a coordinate bond by at least the first modifying group.

Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming method

An object of the present invention is to provide a method capable of producing a tetraalkoxysilane with a high energy efficiency and with a high yield. The present invention provides a method for producing a tetraalkoxysilane, the method including: a first step of reacting an alcohol with a silicon oxide; and a second step of bringing a vaporized component of the reaction mixture obtained in the first step into contact with a molecular sieve.

Method for producing tetraalkoxysilane

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Tsukuba, Japan

Sho Kataoka