Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Shizuo Ogawa

Masami Akimoto

Toshihiko Nagano

Shinji Nagashima

Shinji Koga

Hiroyuki Miyamoto

An apparatus for forming a coating film comprising, a coating unit for forming a coating film by applying a coating solution onto a substrate, and a curing unit for curing the coating film by applying a heating and a cooling to the substrate, in which, the curing unit comprises a heating chamber having a hot plate for heating substrates having the coating solution applied thereon one by one, a cooling chamber communicated with the heating chamber and having a cooling plate for cooling the substrates processed with heat, an inert gas supply mechanism for supplying an insert gas to the heating chamber and the cooling chamber, and an evacuation mechanism for evacuating each of the heating chamber and the cooling chamber.

Apparatus for forming coating film and apparatus for curing the coating film

A processing system comprising a loading/unloading section, a processing section and an interface section. The system further comprises a convey mechanism and at least two waiting sections. The convey mechanism can move in either direction between between the loading/unloading section and the interface section, for conveying objects to the processing units included in the processing section and conveying objects in either direction between the loading/unloading section and the interface section. The waiting sections are provided for temporarily holding an object before the convey mechanism conveys an object to the interface section.

System for processing a plurality of objects contained in a plurality of

Resist processing apparatus having an interface section including two

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Kumamoto, Japan

Shizuo Ogawa