The 59th Institute of China Ordnance Industry

The 59th Institute of China Ordonance Industry

Shitao Dou

Luchang Che

Kun Zhou

Taibin Wu

Xianhe Feng

Chengzhang Wang

Lin Zheng

Changguang He

Lunwu Zhang

Fangchao Zhao

Xin Chen

Jin Zhang

Zhengkun Peng

Yong Xiao

A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.

Device and method for measuring short-wavelength characteristic X-ray diffraction based on array detection

Growing community of inventors

Chongqing, China

Shitao Dou