Ricoh Company, Ltd.

Shiro Yamane

Haruo Hasegawa

Hideaki Ema

Kenji Seki

Fumiaki Arai

Takao Igawa

Hiroyoshi Taniguchi

Tomoshi Nagayama

A thermal direct master for lithography, which comprises a water-resisting substrate and a thermosensitive recording layer formed thereon, which comprises as the main components an inorganic pigment, a binder agent, a thermofusible material and a hydrophilic modified silicon oil. The above-mentioned hydrophilic modified silicon oil may be selected from the group consisting of a carboxyl-modified silicone oil, an alkyl higher alcohol eseter modified silicone oil, an alcohol-modified silicone oil, polyether-modified silicon oil, and an .alpha.-olefin modified silicone oil.

Thermal direct master

Electrophotographic light-sensitive member having a protective coating on a photoconductive layer of the light-sensitive member, said protective coating consisting of an organic high polymer containing Lewis acid.

Electrophotographic light-sensitive member with thin overlayer

Electrophotographic light-sensitive member

A photosensitive material comprising a conductive support provided with a photoconductive layer and a protective layer, wherein the protective layer contains an organic aluminum compound.

Electro photosensitive materials with a protective layer

Growing community of inventors

Yokohama, Japan

Shiro Yamane