Fuji Photo Film Company, Limited

Fujifilm Corporation

Olin Microelectronic Chemicals, Inc.

Shiro Tan

Yasumasa Kawabe

Toru Fujimori

Toshiaki Aoai

Tadayoshi Kokubo

Kazuo Fujita

Shinji Sakaguchi

Kazuya Uenishi

Kenichiro Sato

Tadahiro Sorori

Keiji Akiyama

Fumiyuki Nishiyama

Akira Nishioka

Seiji Uno

Yasunori Takata

Mitsuhiro Imaizumi

Kunihiko Kodama

Kazuyoshi Mizutani

Kenji Honda

Yu Iwai

Ichiro Koyama

Kazuhiro Fujimaki

Yoshimasa Aotani

Koji Shirakawa

Atsushi Nakamura

Akira Nagashima

Satoshi Takita

Wataru Ishii

A method for manufacturing a semiconductor device with a treated member, includes: subjecting an adhesive support having a substrate and an adhesive layer capable of increasing or decreasing in adhesiveness upon irradiation with an actinic ray, radiation or heat to irradiation of the adhesive layer with an actinic ray, radiation or heat, adhering a first surface of a to-be-treated member to the adhesive layer of the adhesive support, applying a mechanical or chemical treatment to a second surface different from the first surface of the to-be-treated member to obtain a treated member, and detaching a first surface of the treated member from the adhesive layer of the adhesive support, wherein the irradiation of the adhesive layer with an actinic ray, radiation or heat is conducted so that adhesiveness decreases toward an outer surface from an inner surface on the substrate side of the adhesive layer.

Manufacturing method of semiconductor device

A lithographic printing plate precursor comprises: a support; and an image-forming layer including a fluoroaliphatic group-containing copolymer, wherein the fluoroaliphatic group-containing copolymer contains a repeating unit corresponding to monomer (i) below and a repeating unit corresponding to monomer (ii) below:

Lithographic printing plate precursor

The present invention provides a copolymer comprising repeating units derived from (A) at least one fluoroalkyl (meth) acrylate represented by the following general formula (I) or (II): wherein, Xrepresents &#x2014;O&#x2014; or &#x2014;NR&#x2014;; Rrepresents &#x2014;H or &#x2014;CH; Rrepresents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 12 carbon atoms or a substituted or unsubstituted aralkyl group having 7 to 24 carbon atoms; Rrepresents H or F; m is an integer ranging from 0 to 10; n is an integer of 2 or 3; and o and p each represents an integer of 1 or 2, and (B) at least one polyoxyalkylene group-containing ethylenically unsaturated monomer, and also provides an image-forming composition, a presensitized plate useful for preparing a lithographic printing plate, a paint composition or a photo resist composition comprising the copolymer. The fluoroaliphatic group-containing copolymer can provide a coating composition capable of simultaneously satisfying the requirements for the ability of a coating liquid to wet the base material and the uniform coating ability upon the application of the liquid and the post-processing aptitudes such as the re-coating ability of the coated film and developing ability as well as the foaming ability of the coating liquid.

Fluoroaliphatic group-containing copolymer

Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R to R each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R to R represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.

Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound

A lithographic printing plate precursor comprises an image forming layer containing at least one polymer compound having a fluoroaliphatic group on the side chain, wherein the fluoroaliphatic group is derived from a fluoroaliphatic compound produced by a telomerization or oligomerization method.

A lithographic printing plate precursor comprises: a support; and an image-forming layer including a copolymer containing a specific fluoroaliphatic group and a repeating unit corresponding to at least one of a poly(oxyalkylene) acrylate and a poly(oxyalkylene) methacrylate.

A presensitized plate for preparing a lithographic printing plate comprises a substrate provided thereon with a light-sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (A) an addition polymerizable monomer having, on a side chain, a fluoro-aliphatic group in which hydrogen atoms are replaced with fluorine atoms and (B) a (meth)acrylate having an ester chain represented by a specific general formula. The use of the foregoing specific fluorine atom-containing polymer permits the formation of a light-sensitive layer having uniform surface condition without causing abnormality in the surface quality due to the foaming phenomenon observed during the production and also permits the production of a positive light-sensitive resin composition having excellent solubility and dispersibility in a developer.

Presensitized plate for preparing lithographic printing plate

A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.

Positive photoresist composition

The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.

Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound

The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.

Positive-working presensitized plate useful for preparing a lithographic printing plate

The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.

Positive resist composition

A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

Positive working photosensitive composition

A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.

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Shizuoka, Japan

Shiro Tan