Sun Chemical Corporation

Shirley M Madamba

John F Pilot

Syeda Husain

Penny M Mullen

A hybrid lith photographic film substantially resistant to the formation of scratch-related defects that occur during the manufacturing and handling process having an anti-abrasion coating on the silver halide emulsion layer containing a polyalkylene oxide surfactant.

Reduced scratch sensitization in nucleated photographic film

The inclusion of isothiouronium functionality onto hydrazide derivatives results in the formation of nucleating agents for lithographic films that produce high contrast and speed with excellent dot quality as required for halftone applications. The level of performance of the nucleators of the invention is sufficiently high that the need to incorporate amine boosters in the lithographic film elements or developers is not required. The novel nucleators have the formula ##STR1## wherein R is hydrogen, C.sub.1 -C.sub.10 alkyl, substituted or unsubstituted carbamoyl, or alkoxy or aryloxy carbonyl; Y is substituted or unsubstituted divalent aryl, and Q is an isothiouronium salt moiety.

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Middletown, NJ, United States of America

Shirley M Madamba