Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Shinzi Kitamura

Akihiro Fujimoto

Hiroichi Inada

Masatoshi Deguchi

Keizo Hasebe

Hiroyuki Iino

Mitsuhiro Nambu

Noriyuki Anai

Takami Satoh

Tatsuya Iwasaki

Takayuki Tomoeda

Kengo Mizosaki

Kouichi Tanoue

Masami Akimoto

Kiyohisa Tateyama

Yasuhiro Sakamoto

An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.

Method of forming coating film and apparatus therefor

Solvent and resist spin coating apparatus

A substrate processing apparatus has an article transferring unit for transferring articles, and an arm assembly is provided on the transferring unit. Each arm of the arm assembly is provided with pawls for contacting and supporting undersurface portions of the peripheral side wall of each of the articles, and one or more sucking portions are provided on the upper surface of the arm and are disposed above the corresponding pawl or pawls. The pawls, or the sucking portion or sucking portions are selected for every process, and supporting or holding of each of the articles and the required transfer of each of the articles are performed. The transfer can be performed by changing the operating range of each of the arms without replacing the arms. Taking each of the articles in and out of the processing units are carried out smoothly and a series of processes are achieve efficiently.

Resist processing apparatus, substrate processing apparatus and method

A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.

Method for scrubbing and cleaning substrate

A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

Device and method for scrubbing and cleaning substrate

Growing community of inventors

Kumamoto-ken, Japan

Shinzi Kitamura